scholarly journals Infrared active phonons in monoclinic lutetium oxyorthosilicate

2020 ◽  
Vol 127 (11) ◽  
pp. 115702 ◽  
Author(s):  
M. Stokey ◽  
A. Mock ◽  
R. Korlacki ◽  
S. Knight ◽  
V. Darakchieva ◽  
...  
2004 ◽  
Vol 49 (18) ◽  
pp. 4305-4319 ◽  
Author(s):  
B J Pichler ◽  
B K Swann ◽  
J Rochelle ◽  
R E Nutt ◽  
S R Cherry ◽  
...  

2004 ◽  
Vol 75 (2) ◽  
pp. 462-466 ◽  
Author(s):  
G. D. Stevens ◽  
S. S. Lutz ◽  
W. D. Turley ◽  
C. D. Adams ◽  
R. M. Boat ◽  
...  

2016 ◽  
Vol 852 ◽  
pp. 1080-1086
Author(s):  
Xiao Xin Zhang ◽  
Jian Jun Xie ◽  
Ying Shi ◽  
Ling Cong Fan ◽  
De Bao Lin ◽  
...  

Lutetium oxyorthosilicate (Lu2SiO5, LSO) doped with Pr3+ was synthesized on cleaned silicon (111) substrates by sol-gel route with the spin-coating technique. XRD patterns indicated that the films were crystallized into A-type LSO phase at 1000 °C, followed by a phase transition to B-type LSO occurred at 1100 °C. SEM observations revealed that the surface of the films was smooth, homogeneous and crack-free. When the sintering temperature was 1000 °C, the average grain size of the crystal particles was 100-200 nm and the thickness of the thin film was about 380 nm when the coating layer number up to 10. While the sintering temperature was 1100 °C, the average grain size of the crystal particles was 200-300 nm and the thickness of the thin film was about 320 nm also 10 layers. PL spectra showed when under 1000 °C, the quenching concentration of Pr3+ was 0.3 mol%, the characteristic emission peaks was 289 nm and 340 nm and the dominant decay time was 4.64 ns; while under 1100 °C, the quenching concentration of Pr3+ was 0.4 mol%, the characteristic emission peaks was 280 nm and 320 nm and the dominant decay time was 2.61 ns.


2004 ◽  
Author(s):  
Michael J. Berninger ◽  
Thomas J. Kwan ◽  
Lin Yin ◽  
Paul Fredrickson

2017 ◽  
Vol 190 ◽  
pp. 504-510 ◽  
Author(s):  
Lingcong Fan ◽  
Ying Shi ◽  
Yiquan Wu ◽  
Jianjun Xie ◽  
Jieyu Zhang ◽  
...  

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