An experimental system for time-resolved x-ray diffraction of deforming silicate melt at high temperature

2020 ◽  
Vol 91 (9) ◽  
pp. 095113
Author(s):  
Satoshi Okumura ◽  
Kentaro Uesugi ◽  
Tatsuya Sakamaki ◽  
Akio Goto ◽  
Masayuki Uesugi ◽  
...  
Keyword(s):  
High Temperature ◽  
Experimental System ◽  
Silicate Melt ◽  
X Ray Diffraction ◽  
Time Resolved ◽  
X Ray

Generation of 1-10 Ps Hard X-Rav Pulses for Time Resolved X-Ray Diffraction

1995 ◽  
Vol 39 ◽  
pp. 95-102
Author(s):  
P. Chen ◽  
I.V. Tomov ◽  
P. M. Rentzepis
Keyword(s):  
Uv Radiation ◽  
Repetition Rate ◽  
Laser System ◽  
Experimental System ◽  
X Ray Diffraction ◽  
Time Resolved ◽  
X Ray ◽  
Deep Uv ◽  
193 Nm

We present a further improvement of our experimental system for the generation of hard x-ray pulses in the range 1-10 ps, A laser system based on a cw mode locked Nd:YLF laser is utilized for the emission of deep UV pulses at 193 nm with duration 1.5 ps and repetition rate of 300 Hz, This UV radiation is used to pump an x-ray diode which produces CuKa x-ray pulses with a duration shorter than 10 ps at 300 Hz.

A furnace for the in situ study of the formation of inorganic solids at high temperature using time-resolved energy-dispersive x-ray diffraction

2000 ◽  
Vol 71 (11) ◽  
pp. 4177 ◽  
Author(s):  
Margret J. Geselbracht ◽  
Richard I. Walton ◽  
E. Sarah Cowell ◽  
Franck Millange ◽  
Dermot O’Hare
Keyword(s):  
High Temperature ◽  
Energy Dispersive ◽  
X Ray Diffraction ◽  
Time Resolved ◽  
X Ray ◽  
Inorganic Solids ◽  
In Situ Study

A time-resolved x-ray diffraction study of Ti5Si3 product formation during combustion synthesis

1997 ◽  
Vol 12 (12) ◽  
pp. 3230-3240 ◽  
Author(s):  
C. R. Kachelmyer ◽  
I. O. Khomenko ◽  
A. S. Rogachev ◽  
A. Varma
Keyword(s):  
Thermal Expansion ◽  
High Temperature ◽  
Product Formation ◽  
X Ray Diffraction ◽  
Temperature Synthesis ◽  
Time Resolved ◽  
X Ray ◽  
Thermal Expansion Coefficients ◽  
High Temperature Synthesis ◽  
Expansion Coefficients

Time-resolved x-ray diffraction (TRXRD) was performed during Ti5Si3 synthesis by the self-propagating high-temperature synthesis mode for different Ti size fractions. It was determined that the time for product formation (ca. 15 s) was independent of Ti particle size. However, the formation of Ti5Si4 phase occurred when relatively large titanium particles were used. A simultaneous measurement of the temperature and TRXRD allowed us to attribute the shifting of XRD peaks at high temperature to thermal expansion of the Ti5Si3 product. The thermal expansion coefficients differ for different crystal planes, and their numerical values compare well with those reported previously in the literature.

Probing Molten Salt Flux Reactions Using Time-Resolved in Situ High-Temperature Powder X-ray Diffraction:  A New Synthesis Route to the Mixed-Valence NaTi2O4

2004 ◽  
Vol 16 (6) ◽  
pp. 1153-1159 ◽  
Author(s):  
Margret J. Geselbracht ◽  
Liam D. Noailles ◽  
Lien T. Ngo ◽  
Jessica H. Pikul ◽  
Richard I. Walton ◽  
...  
Keyword(s):  
High Temperature ◽  
Molten Salt ◽  
Mixed Valence ◽  
Salt Flux ◽  
X Ray Diffraction ◽  
Time Resolved ◽  
X Ray ◽  
Synthesis Route ◽  
New Synthesis
Sign in / Sign up

Export Citation Format

Share Document