Optical quality zinc oxide films have been characterized using
reflection electron diffraction (RED), replication electron microscopy
(REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD).
Significant microstructural differences were observed between rf sputtered
films and planar magnetron rf sputtered films.
Piezoelectric materials have been attractive for applications to
integrated optics since they provide an active medium for signal processing.
Among the desirable physical characteristics of sputtered ZnO films used for
this and related applications are a highly preferred crystallographic
texture and relatively smooth surfaces. It has been found that these
characteristics are very sensitive to the type and condition of the
substrate and to the several sputtering parameters: target, rf power, gas
composition and substrate temperature.
Topological polar structures in ferroelectric oxide films
