Crystal Ion-Slicing of Magnetic and Ferroelectric Oxide Films
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AbstractThe epitaxial separation of single-crystal magnetic and ferroelectric oxide films is presented. Ion implantation is used to create a buried damage layer beneath the surface. The high etch-selectivity of this sacrificial layer makes it possible to detach high quality single-crystal films from bulk samples. Magnetic and electrical properties of the films are discussed.
1998 ◽
Vol 16
(4)
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pp. 2277-2280
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Structure of Palladium Single-Crystal Films Prepared by Flash Evaporation onto (001) NaCl Substrates
1970 ◽
Vol 28
◽
pp. 456-457
Keyword(s):
1998 ◽
Vol 157-158
◽
pp. 143-150
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