scholarly journals Measurement of ion displacement via RF power variation for excess micromotion compensation

2021 ◽  
Vol 129 (12) ◽  
pp. 124302
Author(s):  
Ryoichi Saito ◽  
Kota Saito ◽  
Takashi Mukaiyama
Keyword(s):  
Rf Power ◽  
Power Variation

scholarly journals A Silicon Photonic RF Phase Shifter With Linear Phase Response and Low RF Power Variation

2019 ◽  
Vol 31 (9) ◽  
pp. 713-716
Author(s):  
Qihang Shang ◽  
Yanping Yu ◽  
Yong Zhang ◽  
Yu He ◽  
Shaohua An ◽  
...  
Keyword(s):  
Phase Shifter ◽  
Phase Response ◽  
Linear Phase ◽  
Rf Power ◽  
Power Variation ◽  
Silicon Photonic

Broadband tunable microwave photonic phase shifter with low RF power variation in a high-Q AlN microring

2016 ◽  
Vol 41 (15) ◽  
pp. 3599 ◽  
Author(s):  
Xianwen Liu ◽  
Changzheng Sun ◽  
Bing Xiong ◽  
Jian Wang ◽  
Lai Wang ◽  
...  
Keyword(s):  
Phase Shifter ◽  
Rf Power ◽  
High Q ◽  
Microwave Photonic ◽  
Power Variation ◽  
Tunable Microwave

scholarly journals Tunable Silicon Photonic RF Phase Shifter With Low RF Power Variation Based on Constructive Interference of an Add-Drop Ring Resonator

2018 ◽  
Vol 10 (6) ◽  
pp. 1-8 ◽  
Author(s):  
Yanping Yu ◽  
Qihang Shang ◽  
Shaohua An ◽  
Yong Zhang ◽  
Yikai Su ◽  
...  
Keyword(s):  
Phase Shifter ◽  
Ring Resonator ◽  
Rf Power ◽  
Constructive Interference ◽  
Power Variation ◽  
Silicon Photonic

Effects of RF power variation on properties of N-doped p-type ZnO thin films grown by plasma-assisted MOCVD

2007 ◽  
Vol 29 (12) ◽  
pp. 1612-1615 ◽  
Author(s):  
Yangfan Lu ◽  
Zhizhen Ye ◽  
Yujia Zeng ◽  
Weizhong Xu ◽  
Liping Zhu ◽  
...  
Keyword(s):  
Thin Films ◽  
Zno Thin Films ◽  
Rf Power ◽  
Power Variation ◽  
P Type

518. The Approach of RF Power Variation by Setting the Object in MRI

1991 ◽  
Vol 47 (8) ◽  
pp. 1548
Author(s):  
Hitoshi Kimura ◽  
Toshiaki Tsuji ◽  
Ryuzoh Ueda
Keyword(s):  
Rf Power ◽  
Power Variation

Effects of RF power variation on properties of ZnO thin films and electrical properties of p–n homojunction

2003 ◽  
Vol 254 (3-4) ◽  
pp. 449-455 ◽  
Author(s):  
Deuk-Kyu Hwang ◽  
Kyu-Hyun Bang ◽  
Min-Chang Jeong ◽  
Jae-Min Myoung
Keyword(s):  
Thin Films ◽  
Electrical Properties ◽  
Zno Thin Films ◽  
Rf Power ◽  
Power Variation

Tunable Microwave Phase Shifter with Low RF-Power Variation Based on High-Q Epitaxial AlN Ring Resonator

2016 ◽  
Author(s):  
Xianwen Liu ◽  
Changzheng Sun ◽  
Bing Xiong ◽  
Jian Wang ◽  
Lai Wang ◽  
...  
Keyword(s):  
Phase Shifter ◽  
Ring Resonator ◽  
Rf Power ◽  
High Q ◽  
Power Variation ◽  
Tunable Microwave ◽  
Microwave Phase Shifter

Investigation of ultra-thin films of YBa2Cu3O7−δ grown on MgO

1990 ◽  
Vol 48 (4) ◽  
pp. 6-7
Author(s):  
S.K. Streiffer ◽  
C.B. Eom ◽  
J.C. Bravman ◽  
T.H. Geballet
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Deposition Process ◽  
Nucleation And Growth ◽  
Multilayer Structures ◽  
Rf Power ◽  
Oxygen Loss ◽  
Transmission Electron ◽  
Single Target ◽  
Mtorr Argon

The study of very thin (<15 nm) YBa2Cu3O7−δ (YBCO) films is necessary both for investigating the nucleation and growth of films of this material and for achieving a better understanding of multilayer structures incorporating such thin YBCO regions. We have used transmission electron microscopy to examine ultra-thin films grown on MgO substrates by single-target, off-axis magnetron sputtering; details of the deposition process have been reported elsewhere. Briefly, polished MgO substrates were attached to a block placed at 90° to the sputtering target and heated to 650 °C. The sputtering was performed in 10 mtorr oxygen and 40 mtorr argon with an rf power of 125 watts. After deposition, the chamber was vented to 500 torr oxygen and allowed to cool to room temperature. Because of YBCO’s susceptibility to environmental degradation and oxygen loss, the technique of Xi, et al. was followed and a protective overlayer of amorphous YBCO was deposited on the just-grown films.

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

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