scholarly journals Measurement of ion displacement via RF power variation for excess micromotion compensation

2021 ◽  
Vol 129 (12) ◽  
pp. 124302
Author(s):  
Ryoichi Saito ◽  
Kota Saito ◽  
Takashi Mukaiyama
Keyword(s):  
Rf Power ◽  
2019 ◽  
Vol 31 (9) ◽  
pp. 713-716
Author(s):  
Qihang Shang ◽  
Yanping Yu ◽  
Yong Zhang ◽  
Yu He ◽  
Shaohua An ◽  
...  

2016 ◽  
Vol 41 (15) ◽  
pp. 3599 ◽  
Author(s):  
Xianwen Liu ◽  
Changzheng Sun ◽  
Bing Xiong ◽  
Jian Wang ◽  
Lai Wang ◽  
...  

2018 ◽  
Vol 10 (6) ◽  
pp. 1-8 ◽  
Author(s):  
Yanping Yu ◽  
Qihang Shang ◽  
Shaohua An ◽  
Yong Zhang ◽  
Yikai Su ◽  
...  

2007 ◽  
Vol 29 (12) ◽  
pp. 1612-1615 ◽  
Author(s):  
Yangfan Lu ◽  
Zhizhen Ye ◽  
Yujia Zeng ◽  
Weizhong Xu ◽  
Liping Zhu ◽  
...  

1991 ◽  
Vol 47 (8) ◽  
pp. 1548
Author(s):  
Hitoshi Kimura ◽  
Toshiaki Tsuji ◽  
Ryuzoh Ueda
Keyword(s):  
Rf Power ◽  

2003 ◽  
Vol 254 (3-4) ◽  
pp. 449-455 ◽  
Author(s):  
Deuk-Kyu Hwang ◽  
Kyu-Hyun Bang ◽  
Min-Chang Jeong ◽  
Jae-Min Myoung

Author(s):  
S.K. Streiffer ◽  
C.B. Eom ◽  
J.C. Bravman ◽  
T.H. Geballet

The study of very thin (<15 nm) YBa2Cu3O7−δ (YBCO) films is necessary both for investigating the nucleation and growth of films of this material and for achieving a better understanding of multilayer structures incorporating such thin YBCO regions. We have used transmission electron microscopy to examine ultra-thin films grown on MgO substrates by single-target, off-axis magnetron sputtering; details of the deposition process have been reported elsewhere. Briefly, polished MgO substrates were attached to a block placed at 90° to the sputtering target and heated to 650 °C. The sputtering was performed in 10 mtorr oxygen and 40 mtorr argon with an rf power of 125 watts. After deposition, the chamber was vented to 500 torr oxygen and allowed to cool to room temperature. Because of YBCO’s susceptibility to environmental degradation and oxygen loss, the technique of Xi, et al. was followed and a protective overlayer of amorphous YBCO was deposited on the just-grown films.


Author(s):  
T. A. Emma ◽  
M. P. Singh

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.


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