Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas
Keyword(s):
2006 ◽
Vol 24
(5)
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pp. 1718-1724
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2017 ◽
Vol 35
(5)
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pp. 05C315
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2019 ◽
Vol 28
(4)
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pp. 045003
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Keyword(s):
2001 ◽
Vol 290-293
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pp. 1030-1035
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Keyword(s):
2004 ◽
Vol 76
(1-2)
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pp. 21-54
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