Development of a minimizable pulsed plasma source with structure induced focusability

2022 ◽  
Vol 131 (2) ◽  
pp. 024503
Author(s):  
Zunyi Tian ◽  
Zhongyu Hou
Keyword(s):  
Plasma Source ◽  
Pulsed Plasma

X‐ray lithography using a pulsed plasma source

1981 ◽  
Vol 19 (4) ◽  
pp. 1190-1193 ◽  
Author(s):  
J. S Pearlman ◽  
J. C. Riordan
Keyword(s):  
Plasma Source ◽  
Pulsed Plasma ◽  
X Ray

Design and Characterization of a Pulsed Plasma Source

1998 ◽  
Vol 37 (Part 1, No. 7A) ◽  
pp. 4177-4181 ◽  
Author(s):  
Jozef Kudela ◽  
Igor Odrobina ◽  
Masashi Kando
Keyword(s):  
Plasma Source ◽  
Pulsed Plasma

Pulsed plasma source of refractory metals

1988 ◽  
Vol 31 (4) ◽  
pp. 299-302
Author(s):  
I. I. Murav'ev ◽  
T. M. Gorbunova ◽  
A. M. Yancharina
Keyword(s):  
Plasma Source ◽  
Refractory Metals ◽  
Pulsed Plasma

Diamond-Like Carbon Films Formed by Pulsed Supersonic Plasma Flow Deposition

2014 ◽  
Vol 213 ◽  
pp. 137-142
Author(s):  
Yuri V. Nastaushev ◽  
Tatiana A. Gavrilova ◽  
Evgenij V. Fedosenko ◽  
George A. Pozdnyakov ◽  
Fedor N. Dultsev
Keyword(s):  
Carbon Film ◽  
High Growth ◽  
Plasma Source ◽  
Carbon Films ◽  
High Growth Rate ◽  
Diamond Like Carbon ◽  
Pulsed Plasma ◽  
Force Microscopy ◽  
A New Technique ◽  
Glass Surfaces

A new technique for the formation of diamond-like carbon thin films with high growth rate on silicon wafers and glass surfaces was investigated. A pulsed plasma source based on disk magnetohydrodynamic accelerator was used; methane was a precursor. Scanning electron and atomic-force microscopy, X-ray photoemission spectroscopy techniques and Raman spectroscopy were used for film characterization. We varied the deposition conditions (pulse time, distance to the source, silicon substrate temperature) to optimize diamond-like carbon film properties. Nitrogen treatment allows us to make nitrogen-doped diamond-like carbon films. We used the oxydgen plasmachemical etching of diamond-like carbon films. Thick nanoporous diamond-like carbon films were formed.

Ultrastructure of hydrated proteoglycans using a pulsed plasma source

1981 ◽  
Vol 6 (1) ◽  
pp. 139-148 ◽  
Author(s):  
Barbara J. Panessa ◽  
Richard A. McCorkle ◽  
Philip Hoffman ◽  
John B. Warren ◽  
Grant Coleman
Keyword(s):  
Plasma Source ◽  
Pulsed Plasma

High‐resolution VUV spectrometer/detector investigations of rare‐earth pulsed plasma source (abstract)

1985 ◽  
Vol 56 (5) ◽  
pp. 868-868
Author(s):  
J. R. Roberts ◽  
C. L. Cromer ◽  
J. M. Bridges ◽  
T. B. Lucatorto
Keyword(s):  
Rare Earth ◽  
High Resolution ◽  
Plasma Source ◽  
Pulsed Plasma

Explosion model applied to an intense pulsed plasma source for thin film deposition

1997 ◽  
Vol 25 (1) ◽  
pp. 89-96 ◽  
Author(s):  
P.D. Pedrow ◽  
K.O. Goyal ◽  
R. Mabalingham ◽  
M.A. Osman
Keyword(s):  
Thin Film ◽  
Plasma Source ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Pulsed Plasma
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