Raman Study at Low Temperature of Polyiodidesin the Series DIPSφ4

1982 ◽  
Vol 86 (1) ◽  
pp. 63-69 ◽  
Author(s):  
E. Faulques ◽  
E. Rzepka ◽  
S. Lefrant ◽  
H. Strzelecka
Keyword(s):  
1998 ◽  
Vol 64 (4) ◽  
pp. 179-190 ◽  
Author(s):  
A. Maaej ◽  
M. Bahri ◽  
Y. Abid ◽  
N. Jaidane ◽  
Z. B. Lakhdar ◽  
...  

2003 ◽  
Vol 78 (2) ◽  
pp. 358-362 ◽  
Author(s):  
M.-L Hu ◽  
C.-T Chia ◽  
J.Y Chang ◽  
W.-S Tse ◽  
J.-T Yu

1987 ◽  
Vol 35 (6) ◽  
pp. 2892-2895 ◽  
Author(s):  
J. E. Zucker ◽  
A. Pinczuk ◽  
D. S. Chemla ◽  
A. C. Gossard

1993 ◽  
Vol 5 (3) ◽  
pp. 283-300 ◽  
Author(s):  
M A Laguna ◽  
M L Sanjuan ◽  
V M Orera ◽  
J Rubin ◽  
E Palacios ◽  
...  

2005 ◽  
Vol 97 (10) ◽  
pp. 10A922 ◽  
Author(s):  
L. V. Gasparov ◽  
D. Arenas ◽  
K.-Y. Choi ◽  
G. Güntherodt ◽  
H. Berger ◽  
...  

1986 ◽  
Vol 64 (2) ◽  
pp. 181-187 ◽  
Author(s):  
M.P. Lahalle ◽  
J.C. Krupa ◽  
M. Lepostollec ◽  
J.P. Forgerit

1994 ◽  
Vol 358 ◽  
Author(s):  
Jun-Ichi Hanna ◽  
Takayuki Ohuchi ◽  
Masaji Yamamoto

ABSTRACTWe have investigated the structure and crystallinity of poly SiGe and Ge films in the early stage of their growth prepared at < 450°C by means of a new type of thermal CVD from GeF4 and Si2H6. Raman study and SEM observation of the films revealed that the nucleation of crystallites took place directly on the substrate, followed by the grain growth in a manner of island growth. Thus, the crystallinity of the films is well established even in the very early stage of the growth, probably < 10 nm in thickness, in contrast to the poly Si growth in the low-temperature CVD precesses.


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