The influence of laser wavelength on the structure, morphology, and photoluminescence properties of pulsed laser deposited CaS: Eu2+thin films

2015 ◽  
Vol 62 (13) ◽  
pp. 1102-1109 ◽  
Author(s):  
R.L. Nyenge ◽  
P.T. Sechogela ◽  
H.C. Swart ◽  
O.M. Ntwaeaborwa
Keyword(s):  
Thin Films ◽  
Pulsed Laser ◽  
Laser Wavelength ◽  
Photoluminescence Properties ◽  
Structure Morphology

Highly Conductive and Optically Transparent Polycrystalline Iridium Oxide Thin Films Grown by Reactive Pulsed Laser Deposition

1997 ◽  
Vol 472 ◽  
Author(s):  
M.A. El Khakani ◽  
M. Chaker
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Deposition Temperature ◽  
Room Temperature ◽  
Optical Transmission ◽  
Ambient Pressure ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Structure Morphology ◽  
Quartz Substrates

ABSTRACTReactive pulsed laser deposition has been used to deposit IrO2 thin films on both SiO2 and fused quartz substrates, by ablating a metal iridium target in oxygen atmosphere. At a KrF laser intensity of about 1.7 × 109 W/cm2, IrO2 films were deposited at substrate deposition temperatures ranging from room-temperature to 700 °C under an optimum oxygen ambient pressure of 200 mTorr. The structure, morphology, electrical resistivity and optical transmission of the deposited films were characterized as a function of their deposition temperature (Td). High quality IrO2 films are obtained in the 400–600 °C deposition temperature range. They are polycrystalline with preferred orientations, depending on the substrate, and show a dense granular morphology. At a Td as low as 400 °C, highly conductive IrO2 films with room-temperature resistivities as low as (42±6) μΩ cm are obtained. Over the 300–600 °C Td range, the IrO2 films were found to exhibit a maximum optical transmission at 450 °C (∼ 45 % at 500 nm for 80 nm-thick films).

Structure, Morphology, and Properties of Strontium Barium Niobate Thin Films Grown by Pulsed Laser Deposition

2002 ◽  
Vol 42 (1) ◽  
pp. 219-233 ◽  
Author(s):  
Félix E. Fernández ◽  
Yelitza González ◽  
Huimin Liu ◽  
Antonio Martínez ◽  
Vićtor Rodríguez ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Strontium Barium Niobate ◽  
Strontium Barium ◽  
Structure Morphology

The effects of substrate temperature and laser wavelength on the formation of carbon thin films by pulsed laser deposition

1999 ◽  
Vol 8 (2-5) ◽  
pp. 463-467 ◽  
Author(s):  
Tsuyoshi Yoshitake ◽  
Takashi Nishiyama ◽  
Hajime Aoki ◽  
Koji Suizu ◽  
Koji Takahashi ◽  
...  
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Wavelength ◽  
Laser Deposition ◽  
Carbon Thin Films

THE APPLICATION OF PULSED LASER DEPOSITION IN PRODUCING BIOACTIVE CERAMIC FILMS

2005 ◽  
Vol 12 (03) ◽  
pp. 401-408 ◽  
Author(s):  
YAFAN ZHAO ◽  
CHUANZHONG CHEN ◽  
DIANGANG WANG
Keyword(s):  
Thin Films ◽  
Substrate Temperature ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Processing Parameters ◽  
Laser Wavelength ◽  
Laser Deposition ◽  
Future Application ◽  
Ceramic Films ◽  
Bioactive Ceramic

Pulsed laser deposition (PLD) is a relatively new technique for producing thin films. It presents unique advantages for the deposition of bioactive ceramics. The mechanism and characteristics of the technique PLD are introduced. Its applications and current research status in hydroxyapatite and bioglass thin films are reviewed. The effect of processing parameters of PLD, including atmosphere, substrate temperature, laser wavelength and target properties, on the structures and the properties of the hydroxyapatite film, is analyzed in detail. Future application trends are also analyzed.

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