High-resolution electron microscopy observations of microplastic fracture in SiC under ball milling at room temperature

2001 ◽  
Vol 81 (1) ◽  
pp. 1-8 ◽  
Author(s):  
X.Y. Yang ◽  
Y.K. Wu ◽  
H.Q. Ye
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Ball Milling ◽  
Room Temperature ◽  
High Resolution Electron Microscopy ◽  
Resolution Electron

Dissolution of Copper Precipitates in An Fe−1·3Wt%Cu Alloy Under Fe+ Ion Irradiation

1998 ◽  
Vol 540 ◽  
Author(s):  
A. C. Nicol ◽  
M. L. Jenkins ◽  
N. Wanderka ◽  
C. Abromeit
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Room Temperature ◽  
Ion Irradiation ◽  
High Resolution Electron Microscopy ◽  
Cu Alloy ◽  
Transmission Electron ◽  
Resolution Electron ◽  
The Stability

AbstractThe stability of Cu precipitates in an Fe-1.3wt%Cu alloy under 300 keV Fe+ion irradiation has been investigated using transmission electron microscopy and high-resolution electron microscopy. The irradiations were carried out between room temperature and 550°C at displacement rates of 103 to 10−2 dpa(s)−1 to fluences of up to 30 dpa. Copper precipitates were found to keep their shape but decrease in size under all irradiation conditions. The results are discussed within the framework of a competitive process between irradiation induced ballistic destruction of precipitates by cascades and irradiation-enhanced precipitation.

Time-resolved high-resolution electron microscopy of nanometer-scale electron beam processing of PbTe films

1996 ◽  
Vol 54 ◽  
pp. 980-981
Author(s):  
T. Kizuka ◽  
N. Tanaka
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Electron Microscope ◽  
High Resolution ◽  
Room Temperature ◽  
High Resolution Electron Microscopy ◽  
Nanometer Scale ◽  
Time Resolved ◽  
Electron Beam Processing ◽  
Resolution Electron

Various kinds of nanometer scale processings are required to produce advanced materials, for example, nano-structured electric devices. Electron beam processing at nanometer scale using STEM and TEM, such as drilling and line-writing, is recently interested as a most useful method. Details of structural change during the processing should be elucidated at atomic resolution in order to establish the processing. In the present work we have processed lead telluride (PbTe) films with nanometer electron beam in a high-resolution transmission electron microscope and in-situ observed the variation of atomic arrangements during the processing.PbTe of 99.99% was vacuum-deposited on air-cleaved (001) surfaces of sodium chloride at room temperature. Time-resolved high-resolution electron microscopy was carried out at room temperature using a 200-kV electron microscope (JEOL, JEM2010) equipped with a high sensitive TV camera and a video tape recorder. The spatial resolution of thesystem was 0.2 nm at 200 kV and the time resolution was 1/60 s. Electron beam irradiation density was 120 A/cm2 at the processing and the observation.

High resolution electron microscopy of ion-irradiated GdBa2Cu3O7

1991 ◽  
Vol 6 (4) ◽  
pp. 677-681 ◽  
Author(s):  
G. Van Tendeloo ◽  
M-O. Ruault ◽  
H. Bernas ◽  
M. Gasgnier
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Room Temperature ◽  
High Resolution Electron Microscopy ◽  
Extended Defects ◽  
Twin Boundaries ◽  
Resolution Electron

GdBa2Cu3O7 crystals were irradiated at room temperature with 200 keV Ne ions and 300 keV Xe ions. In situ standard TEM and further HREM studies show two types of extended defects: (i) mobile extended defects, which account for the preferential defect pinning to twin boundaries reported earlier. These defects are rapidly recovered and difficult to observe by HREM investigations; (ii) stable amorphous areas which are clearly identified by HREM observations. Their overlapping and aggregation conceivably lead to amorphization of the sample.

High resolution electron microscopy of molecular crystals III. Radiation processes at room temperature

1984 ◽  
Vol 393 (1805) ◽  
pp. 353-369 ◽  
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
Radiation Damage ◽  
Room Temperature ◽  
High Resolution Electron Microscopy ◽  
Resolution Electron ◽  
Wide Range ◽  
Preferential Loss ◽  
Peripheral Atom ◽  
Radiation Processes

High resolution electron microscopy has shown that the morphology of radiation damage was similar for a wide range of crystalline organic compounds. The considerable lack of contrast suffered by halogenated compounds in regions of radiation damage seems to arise from preferential loss of halogen from these areas. This aspect of loss of peripheral atom from the molecule is also supported by results obtained by encapsulating the specimen between carbon and other films. The encapsulation reduced the effect of radiation damage and it is suggested that the encapsulation held the peripheral atoms in the crystal, which enabled them to recombine with ions and radicals formed by the damage and to prevent molecular degradation. A reaction mechanism based on this premise is proposed.

Structural analysis of the surface-layer protein of spirillum serpens by high-resolution electron microscopy

1983 ◽  
Vol 41 ◽  
pp. 738-739
Author(s):  
W. H. Wu ◽  
R. M. Glaeser
Keyword(s):  
Electron Microscopy ◽  
Surface Layer ◽  
Structural Analysis ◽  
High Resolution ◽  
Low Dose ◽  
High Resolution Electron Microscopy ◽  
Optical Diffraction ◽  
Surface Layer Protein ◽  
Morphological Unit ◽  
Resolution Electron

Spirillum serpens possesses a surface layer protein which exhibits a regular hexagonal packing of the morphological subunits. A morphological model of the structure of the protein has been proposed at a resolution of about 25 Å, in which the morphological unit might be described as having the appearance of a flared-out, hollow cylinder with six ÅspokesÅ at the flared end. In order to understand the detailed association of the macromolecules, it is necessary to do a high resolution structural analysis. Large, single layered arrays of the surface layer protein have been obtained for this purpose by means of extensive heating in high CaCl2, a procedure derived from that of Buckmire and Murray. Low dose, low temperature electron microscopy has been applied to the large arrays.As a first step, the samples were negatively stained with neutralized phosphotungstic acid, and the specimens were imaged at 40,000 magnification by use of a high resolution cold stage on a JE0L 100B. Low dose images were recorded with exposures of 7-9 electrons/Å2. The micrographs obtained (Fig. 1) were examined by use of optical diffraction (Fig. 2) to tell what areas were especially well ordered.

Sign in / Sign up

Export Citation Format

Share Document