An experimental and computer simulation study of the process of buried SiO2layer formation after oxygen ion implantation into silicon
1990 ◽
Vol 115
(1-3)
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pp. 157-171
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Keyword(s):
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1985 ◽
Vol 43
◽
pp. 300-301
2021 ◽
Vol 719
(4)
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pp. 042065
1996 ◽
Vol 100
(9)
◽
pp. 1399-1401
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Keyword(s):
2007 ◽
Vol 68
(3)
◽
pp. 389-393
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1991 ◽
Vol 38
(2)
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pp. 149-153
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