Negative charge injection to a wafer in a pulsed two-frequency capacitively coupled plasma for oxide etching; diagnostics by emission-selected computerized tomography
2004 ◽
Vol 37
(16)
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pp. 2223-2231
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2002 ◽
Vol 11
(2)
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pp. 142-145
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Keyword(s):
Keyword(s):
Keyword(s):
2012 ◽
Vol 33
(10)
◽
pp. 104004
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2004 ◽
Vol 32
(1)
◽
pp. 90-100
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Keyword(s):
1997 ◽
Vol 52
(13)
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pp. 1983-1993
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