Spectroscopic characterization of the plasma generated during the deposition of AlxGa1−xN films by pulsed laser co-ablation of Al and GaAs targets in electron cyclotron resonance nitrogen plasma

2015 ◽  
Vol 48 (24) ◽  
pp. 245203 ◽  
Author(s):  
Peipei Liang ◽  
Hua Cai ◽  
Yanli Li ◽  
Xu Yang ◽  
Qinghu You ◽  
...  
2015 ◽  
Vol 3 (20) ◽  
pp. 5307-5315 ◽  
Author(s):  
Hua Cai ◽  
Peipei Liang ◽  
René Hübner ◽  
Shengqiang Zhou ◽  
Yanli Li ◽  
...  

Ternary AlxGa1−xN films with different Al compositions were synthesized on sapphire and Si substrates by pulsed laser co-ablation of a polycrystalline GaAs target and a metallic Al target in nitrogen plasma generated by electron cyclotron resonance discharge of N2 gas.


2008 ◽  
Vol 62 (11) ◽  
pp. 1256-1261 ◽  
Author(s):  
J. Y. Tang ◽  
W. Zhang ◽  
J. Sun ◽  
N. Xu ◽  
C. Ge ◽  
...  

The influence of pulsed laser ablation of an aluminum target on the nitrogen plasma produced by electron cyclotron resonance (ECR) microwave discharge has been studied by optical emission spectroscopy (OES) with time and space resolution. The continuous wave (CW) feature of the optical emissions from the ECR nitrogen plasma turns to vary with time and space due to pulsed laser ablation and the expansion of the ablation-induced aluminum plume in the nitrogen plasma. The optical emissions from the nitrogen plasma increase significantly and the emission intensity of nitrogen molecular ions is observed to be more than 20 times higher with the target being ablated in comparison to the case without target ablation. The comparison of the optical emissions from the nitrogen plasma with those from the aluminum plume indicates that the excitation enhancement of the nitrogen plasma occurs in the region where the aluminum plume is expanding, revealing that the expansion of the aluminum plume leads to the excitation enhancement of the nitrogen plasma. Relevant mechanisms responsible for the excitation enhancement of the nitrogen plasma through hybrid processes of ECR microwave discharge and pulsed laser ablation are also discussed.


2003 ◽  
Vol 42 (Part 1, No. 9B) ◽  
pp. 6019-6022 ◽  
Author(s):  
Takashi Arai ◽  
Shigeo Ito ◽  
Kazuo Ishikawa ◽  
Kiyoshi Nakamura

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