Chemical and electrical characterization of AlGaAs/GaAs heterojunction bipolar transistors treated by electron cyclotron resonance plasmas

Applied Physics Letters ◽

10.1063/1.107122 ◽

1992 ◽

Vol 60 (16) ◽

pp. 1996-1998 ◽

Author(s):

P. W. Li ◽

Q. Wang ◽

E. S. Yang

Keyword(s):

Heterojunction Bipolar Transistors ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electrical Characterization ◽

Bipolar Transistors ◽

Electron Cyclotron

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Low damage etching of InGaAs/AlGaAs by the electron cyclotron resonance plasma with Cl2/He mixture for heterojunction bipolar transistors

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587033 ◽

1994 ◽

Vol 12 (2) ◽

pp. 530 ◽

Author(s):

S. Miyakuni

Keyword(s):

Heterojunction Bipolar Transistors ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Bipolar Transistors ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Resonance Plasma

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Electron cyclotron resonance hydrogen and nitrogen plasma surface passivation of AlGaAs/GaAs heterojunction bipolar transistors

IEEE Electron Device Letters ◽

10.1109/55.144966 ◽

1992 ◽

Vol 13 (2) ◽

pp. 83-85 ◽

Author(s):

Q. Wang ◽

P.W. Li ◽

R.M. Osgood ◽

W.I. Wang ◽

E.S. Yang ◽

...

Keyword(s):

Heterojunction Bipolar Transistors ◽

Cyclotron Resonance ◽

Surface Passivation ◽

Electron Cyclotron Resonance ◽

Nitrogen Plasma ◽

Bipolar Transistors ◽

Electron Cyclotron ◽

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AlInAs/InGaAs based heterojunction bipolar transistors fabricated by electron cyclotron resonance etch

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.585448 ◽

1991 ◽

Vol 9 (3) ◽

pp. 1445 ◽

Author(s):

T. R. Fullowan

Keyword(s):

Heterojunction Bipolar Transistors ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Bipolar Transistors ◽

Electron Cyclotron

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Electrical Characterization of Germanium Oxide/Germanium Interface Prepared by Electron-Cyclotron-Resonance Plasma Irradiation

Japanese Journal of Applied Physics ◽

10.1143/jjap.44.6981 ◽

2005 ◽

Vol 44 (9B) ◽

pp. 6981-6984 ◽

Author(s):

Yukio Fukuda ◽

Tomoo Ueno ◽

Shigeru Hirono ◽

Satoshi Hashimoto

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electrical Characterization ◽

Electron Cyclotron ◽

Germanium Oxide ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Irradiation ◽

Resonance Plasma

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Electrical characterization of electron cyclotron resonance deposited silicon nitride dual layer for enhanced Al/SiNx:H/InP metal–insulator–semiconductor structures fabrication

Journal of Applied Physics ◽

10.1063/1.371774 ◽

1999 ◽

Vol 86 (12) ◽

pp. 6924-6930 ◽

Author(s):

R. Peláez ◽

E. Castán ◽

S. Dueñas ◽

J. Barbolla ◽

E. Redondo ◽

...

Keyword(s):

Silicon Nitride ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electrical Characterization ◽

Electron Cyclotron ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Semiconductor Structures

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MBE grown Npn AlGaAs/GaAs bipolar transistors with C p doping by electron cyclotron resonance source activated methane

Electronics Letters ◽

10.1049/el:19910293 ◽

1991 ◽

Vol 27 (5) ◽

pp. 465 ◽

Author(s):

G. Liu ◽

D. Mui ◽

S. Fang ◽

G. Gao ◽

H. Morkoç

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Bipolar Transistors ◽

Electron Cyclotron

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Electrical Characterization of SiGe Heterojunction Bipolar Transistors (HBTs) Formed by Molecular Beam Epitaxy (MBE)

Condensed Systems of Low Dimensionality - NATO ASI Series ◽

10.1007/978-1-4684-1348-9_51 ◽

1991 ◽

pp. 669-674

Author(s):

D. J. Godfrey

Keyword(s):

Molecular Beam Epitaxy ◽

Heterojunction Bipolar Transistors ◽

Molecular Beam ◽

Electrical Characterization ◽

Bipolar Transistors

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Etch characterization of a broad‐beam electron cyclotron resonance ion source

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.576610 ◽

1990 ◽

Vol 8 (3) ◽

pp. 2945-2949 ◽

Author(s):

E. Ghanbari ◽

T. Nguyen ◽

S. Bui ◽

E. Ostan

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Electron Cyclotron ◽

Beam Electron ◽

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Spectroscopic characterization of the plasma generated during the deposition of AlxGa1−xN films by pulsed laser co-ablation of Al and GaAs targets in electron cyclotron resonance nitrogen plasma

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/48/24/245203 ◽

2015 ◽

Vol 48 (24) ◽

pp. 245203 ◽

Author(s):

Peipei Liang ◽

Hua Cai ◽

Yanli Li ◽

Xu Yang ◽

Qinghu You ◽

...

Keyword(s):

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Pulsed Laser ◽

Spectroscopic Characterization ◽

Nitrogen Plasma ◽

Electron Cyclotron

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Characterization of Ar/Cu electron‐cyclotron‐resonance plasmas using optical emission spectroscopy

Journal of Applied Physics ◽

10.1063/1.363177 ◽

1996 ◽

Vol 80 (5) ◽

pp. 2605-2613 ◽

Author(s):

R. L. Rhoades ◽

S. M. Gorbatkin

Keyword(s):

Cyclotron Resonance ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Electron Cyclotron Resonance ◽

Optical Emission ◽

Electron Cyclotron

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