Cerium oxide is widely used for chemomechanical polishing (CMP) of silicate glasses. Uses include finishing of optical elements and planarizing dielectrics in the semiconductor industry. This study is designed to investigate the fundamentals of the cerium oxide/silica CMP process by measuring the interaction force between silicate glasses and cerium oxide. Surface forces involved in the polishing of glass by a cerium oxide abrasive can be studied in a controlled manner by measuring sample-tip interactions between a glass substrate and a cerium oxide tip in an atomic force microscope (AFM). Commercially available AFM tips have been coated with thin, uniform films of cerium oxide. By using a square pyramid tip as a template for the shape of the cerium oxide film, challenges related to irregular or blunt tip shape can be overcome. However, complete characterization of structure, shape and chemical composition is required before useful information can be obtained using the AFM.
Microstructure Characterization of Noble Metal-Silica Nanocomposites
