High temperature characterization of PZT(0.52/0.48) thin-film pressure sensors

2013 ◽  
Vol 24 (1) ◽  
pp. 015017 ◽  
Author(s):  
M Asadnia ◽  
A G P Kottapalli ◽  
J M Miao ◽  
A B Randles ◽  
A Sabbagh ◽  
...  
2005 ◽  
Vol 52 (10) ◽  
pp. 983-987 ◽  
Author(s):  
Yunxiang Tong ◽  
Yong Liu ◽  
Jianmin Miao ◽  
Liancheng Zhao

1991 ◽  
Vol 11 (2) ◽  
pp. 255-268 ◽  
Author(s):  
T. E. van Deventer ◽  
P. B. Katehi ◽  
J. Y. Josefowicz ◽  
D. B. Rensch

2011 ◽  
Vol 117-119 ◽  
pp. 840-844
Author(s):  
Xu Yong Wu ◽  
De Yin Zhang ◽  
Kun Li

The novel lithium enriched lithium tantalate (LiTaO3) targets were papered by employing the sol-gel process and the high temperature sintered process. The sol of LiTaO3 was firstly prepared through reacting lithium ethoxide with tantalum ethoxide. The LiTaO3 powder was fabricated by presintered LiTaO3 dry gel 4 hour, at 800°C. The 11cm13cm1cm lithium enriched LiTaO3 target samples were prepared by sintered the pressed LiTaO3 powder billet 4 hour in the 850°C muffle furnace. The density of the 5% overdose lithium enriched LiTaO3 target is measured 5.96g/cm3. The XRD measured results show that the ion beam enhanced deposited (IBED) thin film samples using the prepared 5% overdose lithium enriched LiTaO3 target have the polycrystal structure of LiTaO3, but there has remanent Ta2O5 existed in the IBED thin film samples. The main reason for the remanent Ta2O5 growth was due to the stoichiometric proportion mismatch between Li and Ta in the IBED thin film samples during the high temperature annealed process, which caused the lithium oxide evaporation loss from the IBED thin film samples and made the proportion of Ta2O5 increase. After multipule repeated target prepared experiments, the 8.76% overdose lithium enriched LiTaO3 target is suitable for fabricating the 550°C annealed IBED LiTaO3 thin film. After the repeated process experiments, the suitable deposited process parameters of the IBED-C600M instrument for the 8.76% overdose lithium enriched LiTaO3 target were obtained. The SEM micrographs of the 550°C annealed IBED LiTaO3 thin films prepared by the 8.76% overdose lithium enriched LiTaO3 target reveal the prepared thin films are uniform, smooth and crack-free on the surface, and the perfect adhesion between the thin film and the substrate. The successfully fabricated LiTaO3 thin film samples verify the prepared processes of novel LiTaO3 sputtering target are effective.


1989 ◽  
Vol 25 (2) ◽  
pp. 1305-1308 ◽  
Author(s):  
K.P. Daly ◽  
A.H. Silver ◽  
R.W. Simon ◽  
C.E. Platt ◽  
A.E. Lee ◽  
...  

1996 ◽  
Vol 436 ◽  
Author(s):  
G. Bitko ◽  
R. Harries ◽  
J. Matldn ◽  
A. C. McNeil ◽  
D. J. Monk ◽  
...  

AbstractSilicon bulk micromachined piezoresistive pressure sensors are very sensitive to applied stresses: that is, applied pressure and/or packaging-related stresses. Device encapsulation has been observed to affect the electrical output of the pressure sensor significantly. The magnitude of the zero applied pressure output voltage (i.e., the offset voltage) that can be attributed to a thin film encapsulant is proportional to the magnitude of the roomtemperature thermal stress of that film. Parylene C coatings have been used as encapsulants in this work. Finite element and analytical modeling techniques were used to evaluate the effect of material property variation on the offset of a pressure sensor. A simple, linear expression of offset as a function of a material property parametric group, that includes: parylene thickness, parylene biaxial modulus, parylene CTE, silicon thickness, and annealing temperature; has been established. Experimental analysis of parylene coated pressure sensors and parylene coated silicon and gallium arsenide wafers was performed to confirm the resulting model. Known variations in parylene material properties caused by processing (i.e., uncontrolled deposition, annealing, and high temperature storage) have been used as an experimental vehicle for this purpose. An empirical relationship between offset voltage on parylene coated devices and room-temperature thermal stress on parylene coated wafers that have been exposed to the same processing is a linear expression with a similar slope to the modeling results. Furthermore, stress measurements from parylene coated silicon wafers and parylene coated gallium arsenide wafers have been used to estimate the parylene biaxial modulus (approximately 5000 MPa) and the parylene CTE (approximately 50 ppm/°C) independently. These material properties were observed to shift following parylene annealing and high temperature storage exposure experiments in a manner that is consistent with the established model.


2007 ◽  
Vol 40 (11) ◽  
pp. 2569-2572 ◽  
Author(s):  
Elizabeth I. Drewniak ◽  
Joseph J. Crisco ◽  
David B. Spenciner ◽  
Braden C. Fleming

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