Effect of border traps on the threshold voltage instability of fluoride-doped AlGaN/GaN metal–insulator–semiconductor high-electron-mobility transistors

2019 ◽  
Vol 52 (19) ◽  
pp. 195102 ◽  
Author(s):  
Li-Cheng Chang ◽  
Shin-Yi Yin ◽  
Chao-Hsin Wu
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