Low contact resistivity of Ti/TiN/Al for NiSi2 on epitaxial Si:P structure at full low temperature process below 450oC
2016 ◽
Vol 63
(12)
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pp. 5060-5063
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2016 ◽
Vol 213
(9)
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pp. 2446-2451
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Keyword(s):
Keyword(s):
2008 ◽
Vol 22
(6)
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pp. 1114-1121
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2004 ◽
Vol 87
(9)
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pp. 1782-1784
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