scholarly journals Formation of carbon nanoscale elements of vacuum microelectronics by plasma treatment of SiC

2020 ◽  
Vol 1695 ◽  
pp. 012028
Author(s):  
A A Rezvan ◽  
I N Kots ◽  
R V Tominov ◽  
V S Klimin ◽  
O A Ageev
Keyword(s):  
Plasma Treatment ◽  
Vacuum Microelectronics

Surface Modification of Si Field Emitter Arrays for Vacuum Sealing

2000 ◽  
Vol 621 ◽  
Author(s):  
M. Nagao ◽  
H. Tanabe ◽  
T. Kobayashi ◽  
T. Matsukawa ◽  
S. Kanemaru ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Vacuum Packaging ◽  
Field Emitter ◽  
Vacuum Sealing ◽  
Field Emitter Arrays ◽  
Vacuum Microelectronics ◽  
Field Emission Displays ◽  
Before And After ◽  
Heating Treatment ◽  
Field Emitter Array

ABSTRACTVacuum packaging is a very important issue for vacuum microelectronics devices, especially for field emission displays. Emission current from the field emitter array (FEA), however, is known to decrease significantly after the vacuum packaging process. The current decrease is caused by heating treatment in the vacuum sealing process. In the present paper, the effect of the heating treatment on Si FEA was investigated and CHF3 plasma treatment was proposed for avoiding the problem. The Si FEA was exposed to plasma for 15sec and emission characteristics were measured before and after the vacuum sealing process using frit. It was confirmed that CHF3 plasma treatment was very effective for avoiding the emission degradation of the Si FEA. Details of the heating damage and CHF3 plasma treatment are described.

Surface Modification of Si Field Emitter Arrays for Vacuum Sealing

2000 ◽  
Vol 620 ◽  
Author(s):  
M. Nagao ◽  
H. Tanabe ◽  
T. Kobayashi ◽  
T. Matsukawa ◽  
S. Kanemaru ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Vacuum Packaging ◽  
Field Emitter ◽  
Vacuum Sealing ◽  
Field Emitter Arrays ◽  
Vacuum Microelectronics ◽  
Field Emission Displays ◽  
Before And After ◽  
Heating Treatment ◽  
Field Emitter Array

ABSTRACTVacuum packaging is a very important issue for vacuum microelectronics devices, especially for field emission displays. Emission current from the field emitter array (FEA), however, is known to decrease significantly after the vacuum packaging process. The current decrease is caused by heating treatment in the vacuum sealing process. In the present paper, the effect of the heating treatment on Si FEA was investigated and CHF3 plasma treatment was proposed for avoiding the problem. The Si FEA was exposed to plasma for 15sec and emission characteristics were measured before and after the vacuum sealing process using frit. It was confirmed that CHF3 plasma treatment was very effective for avoiding the emission degradation of the Si FEA. Details of the heating damage and CHF3 plasma treatment are described.

Activity of Ag Nanoparticle Supported Zeolite after Plasma Treatment

2013 ◽  
Vol 133 (3) ◽  
pp. 144-145 ◽  
Author(s):  
Yoshiyuki Teramoto ◽  
Hyun-Ha Kim ◽  
Atsushi Ogata ◽  
Nobuaki Negishi
Keyword(s):  
Plasma Treatment ◽  
Ag Nanoparticle

Investigation of Plasma Treatment Conditions for Wafer-Scale Room-Temperature Bonding Using Ultrathin Au Films in Ambient Air

2019 ◽  
Vol 139 (7) ◽  
pp. 217-218
Author(s):  
Michitaka Yamamoto ◽  
Takashi Matsumae ◽  
Yuichi Kurashima ◽  
Hideki Takagi ◽  
Tadatomo Suga ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Room Temperature ◽  
Ambient Air ◽  
Wafer Scale ◽  
Treatment Conditions

THE MODIFICATION OF PAPER INDUCED BY RADIO FREQUENCY AND MICROWAVE PLASMA TREATMENT

2007 ◽  
Vol 11 (4) ◽  
pp. 593-600
Author(s):  
V. V. Azharonok ◽  
I. I. Filatova ◽  
A. P. Dostanko ◽  
S. V. Bordusov ◽  
Yu. S. Shynkevich
Keyword(s):  
Radio Frequency ◽  
Plasma Treatment ◽  
Microwave Plasma

Plasma Treatment Effect on the Paramagnetic Species of Barley Seed Radical's Intensity: An EPR study

2020 ◽  
Author(s):  
Pankaj Attri ◽  
Anan Teruki ◽  
Ryo Arita ◽  
Takamasa Okumura ◽  
Hayate Tanaka ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Treatment Effect ◽  
Barley Seed ◽  
Paramagnetic Species
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