Investigation and comparison of pulsed laser deposited binary ZnO/MoO3 and ZnO/TiO2 thin films as gate dielectric sensing membranes for pH-ISFET application

Abstract The research work aims to investigate and compare the pulsed laser deposited binary ZnO/MoO3 and ZnO/TiO2 thin films as gate dielectric insulator sensing membranes for pH-ISFET application. The thin films were deposited using pulsed laser deposition as deposited temperature and deposited at 923 K. The films were characterized using SEM, XRD and electrochemical impedance spectroscopy. For the statistical analysis, the sample sizes were calculated with a pretest power of 80% and an error rate of 0.05. The capacitance of the pulsed laser deposited thin films of the binary ZnO/MoO3 and ZnO/TiO2 as gate dielectric insulator sensing membranes were compared with a total sample size of 122. The SEM results shows the uniform arrangement of the nanostructures. The XRD reveals the amorphous nature of both the thin films. The experimental results obtained for the binary ZnO/MoO3 and ZnO/TiO2 provided stack capacitance with a significance value of 0.0001 (p less than 0.05). Pulsed laser deposited binary ZnO/TiO2 thin films as gate dielectric insulator sensing membranes for pH-ISFET application shows significantly better than binary ZnO/MoO3.

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Efficient removal of 2-chlorophenol from aqueous solution using TiO2 thin films/alumina disc as photocatalyst by pulsed laser deposition

Applied Water Science ◽

10.1007/s13201-021-01372-x ◽

2021 ◽

Vol 11 (2) ◽

Author(s):

S. Ismat Shah ◽

Sawsan A. Mahmoud ◽

Samar H. Bendary ◽

Ahmed K. Aboulgheit ◽

A. A. Salem ◽

...

Keyword(s):

Thin Films ◽

Photocatalytic Degradation ◽

Pulsed Laser Deposition ◽

Catalyst Surface ◽

Irradiation Time ◽

Pulsed Laser ◽

Textural Properties ◽

Laser Deposition ◽

Hydroxyl Groups ◽

Tio2 Thin Films

AbstractPulsed laser deposition facilitates the epitaxial deposition and growth of TiO2 at low temperature on hot substrate. In this study, nanosized nitrogen-doped TiO2 thin films were deposited on fabricated alumina disc-shaped and glass substrates. Textural properties of the fabricated disc and alumina disc-supported TiO2 were investigated using N2 adsorption–desorption isotherms, field emission scanning electron microscopy (FESEM), X-ray diffraction and Fourier transform infrared (FTIR) spectroscopy. FESEM showed the presence of single crystals of TiO2 on the alumina disc. FTIR showed the presence of octahedral TiO2 and different hydroxyl groups on the surface which is responsible for the photoactivity and also showed the functional groups adsorbed on the catalyst surface after the photocatalytic degradation. The concentration of 2-chlorophenol and the photo-redox intermediate products as a function of irradiation time was determined. The concentration of the produced chloride ion during the photocatalytic degradation was determined by an ion chromatography. The results showed that the photocatalytic activity of the catalyst decreased upon cycling. The obtained results were compared with nanostructured TiO2 supported on glass substrate. Higher efficiency of 100% degradation was achieved for TiO2/Al2O3 catalyst, whereas about 70% degradation of 2-CP was achieved using TiO2/glass. Different photointermediates of 2-CP degradation have been identified for each cycle. The difference of intermediates is supported by the adsorbed fragments on the catalyst surface.

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Effect of Annealing on Structural and Optical Properties of Pulsed Laser Deposited Titanium Dioxide Thin Films

Advanced Materials Research ◽

10.4028/www.scientific.net/amr.67.65 ◽

2009 ◽

Vol 67 ◽

pp. 65-70 ◽

Cited By ~ 1

Author(s):

Gaurav Shukla ◽

Alika K. Khare

Keyword(s):

Thin Films ◽

Optical Properties ◽

Pulsed Laser Deposition ◽

Annealing Temperature ◽

Ambient Pressure ◽

Pulsed Laser ◽

Laser Deposition ◽

Tio2 Thin Films ◽

Post Annealing ◽

Post Annealing Temperature

TiO2 is a widely studied material for many important applications in areas such as environmental purification, photocatalyst, gas sensors, cancer therapy and high effect solar cell. However, investigations demonstrated that the properties and applications of titanium oxide films depend upon the nature of the crystalline phases present in the films, i.e. anatase and rutile phases. We report on the pulsed laser deposition of high quality TiO2 thin films. Pulsed Laser deposition of TiO2 thin films were performed in different ambient viz. oxygen, argon and vacuum, using a second harmonic of Nd:YAG laser of 6 ns pulse width. These deposited films of TiO2 were further annealed for 5hrs in air at different temperatures. TiO2 thin films were characterized using x-ray diffraction, SEM, photoluminescence, transmittance and reflectance. We observed effect of annealing over structural, morphological and optical properties of TiO2 thin films. The anatase phase of as-deposited TiO2 thin films is found to change into rutile phase with increased annealing temperature. Increase in crystalline behaviour of thin films with post-annealing temperature is also observed. Surface morphology of TiO2 thin films is dependent upon ambient pressure and post- annealing temperature. TiO2 thin films are found to be optically transparent with very low reflectivity hence will be suitable for antireflection coating applications.

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