This paper systematically studies the distribution of macro-particles on the surface of film influenced by the substrate position under conditions of the same magnetic field, different pulsed bias voltage and reaction gas partial pressure, and analyzes the mechanism of macro-particles influenced by different parameters. This study indicates that the substrate position has a better effect on decreasing macro-particles than that of the pulsed bias voltage and particles in different substrate position are very different in their forms and appearances, which easily leads to uneven deposition; under the same bias, the number of particles firstly increases and then decreases with the increasing the distance from substrate position to the center, and the number of particles with over 2μm diameter largely decreases with the increasing the distance from substrate position to the center, so surface morphologies of films are improving; under the lower intensity of magnetic field, the distribution of macro-particles has a great change with the increasing the distance from substrate position to the center, and under the higher intensity of magnetic field, the substrate position has little influence on the distribution of macro-particles on the surface of film. Under the higher intensity (30G) of magnetic field, the distribution of macro-particles on the surface of film has minor change whatever reaction gas partial pressure and substrate position increase, and most particles are small in sizes and are solid spherical in shape. The higher intensity (30G) of magnetic field enhances the uniformity of film deposition and decreases the dependency of macro-particles distribution on other parameters.
Designing TiO2 nanostructures through hydrothermal growth: influence of process parameters and substrate position
