In-situ, analytical, high-voltage and high-resolution transmission electron microscopy of Xe ion implantation into Al

1999 ◽  
Vol 48 (5) ◽  
pp. 511-518 ◽  
Author(s):  
K. Furuya ◽  
k. Mitsuishi ◽  
M. Song ◽  
T. Saito
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Ion Implantation ◽  
High Voltage ◽  
Transmission Electron

In-Situ Transmission Electron Microscopy and Computer Simulation Study of the Kinetics of Oxygen Loss in Yba2Cu3OZ

1989 ◽  
Vol 169 ◽  
Author(s):  
C. P. Burmester ◽  
L. T. Wille ◽  
R. Gronsky ◽  
B. T. Ahn ◽  
V. Y. Lee ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
High Resolution ◽  
Computer Simulation Study ◽  
Oxygen Loss ◽  
Domain Structures ◽  
Transmission Electron ◽  
Kinetics Of ◽  
Image Simulations

AbstractHigh resolution transmission electron microscopy during in‐situ quenching of YBa2Cu3Oz is used to study the kinetics of microdomain formation during oxygen loss in this system. Image simulations based on atomic models of oxygen‐vacancy order in the basal plane of this material generated by Monte Carlo calculations are used to interpret high resolution micrographs of the structures obtained by quenching. The observed domain structures agree well with those obtained from the simualtions.

Sign in / Sign up

Export Citation Format

Share Document