Magnetostatically Induced Easy-Cone Magnetic State Tuning by Perpendicular Magnetic Anisotropy in an Unbiased Spin-Torque Diode

2021 ◽  
Vol 15 (5) ◽  
Author(s):  
A.G. Buzdakov ◽  
P.N. Skirdkov ◽  
K.A. Zvezdin
AIP Advances ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 025234
Author(s):  
P. Yu. Artemchuk ◽  
O. V. Prokopenko ◽  
E. N. Bankowski ◽  
T. J. Meitzler ◽  
V. S. Tyberkevych ◽  
...  

2021 ◽  
Vol 15 (1) ◽  
pp. 013001
Author(s):  
Minori Goto ◽  
Reika Kobayashi ◽  
Ryota Okuno ◽  
Tomohito Mizuno ◽  
Takekazu Yamane ◽  
...  

Abstract We investigated the heat controlled magnetic anisotropy (HCMA) in magnetic tunnel junctions with various junction sizes. We evaluated the HCMA from perpendicular magnetic anisotropy under a direct current voltage measured by the spin-torque diode technique. The maximum HCMA magnitude of 5.4 μJ (Wm)−1 was observed, and the HCMA increased with increasing diameter. Our results can be explained by a simple heat dissipation model and suggest that the in-plane heat current affects HCMA.


Author(s):  
A.E.M. De Veirman ◽  
F.J.G. Hakkens ◽  
W.M.J. Coene ◽  
F.J.A. den Broeder

There is currently great interest in magnetic multilayer (ML) thin films (see e.g.), because they display some interesting magnetic properties. Co/Pd and Co/Au ML systems exhibit perpendicular magnetic anisotropy below certain Co layer thicknesses, which makes them candidates for applications in the field of magneto-optical recording. It has been found that the magnetic anisotropy of a particular system strongly depends on the preparation method (vapour deposition, sputtering, ion beam sputtering) as well as on the substrate, underlayer and deposition temperature. In order to get a better understanding of the correlation between microstructure and properties a thorough cross-sectional transmission electron microscopy (XTEM) study of vapour deposited Co/Pd and Co/Au (111) MLs was undertaken (for more detailed results see ref.).The Co/Pd films (with fixed Pd thickness of 2.2 nm) were deposited on mica substrates at substrate temperatures Ts of 20°C and 200°C, after prior deposition of a 100 nm Pd underlayer at 450°C.


2002 ◽  
Vol 81 (21) ◽  
pp. 4017-4019 ◽  
Author(s):  
T. G. Kim ◽  
Y. H. Shin ◽  
J. H. Song ◽  
M. C. Sung ◽  
I. S. Kim ◽  
...  

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