Defect creation and removal in hydrogenated amorphous silicon predicted by the defect-pool model and revealed by the quasistatic capacitance of metal-insulator-semiconductor structures
1997 ◽
Vol 55
(16)
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pp. R10181-R10184
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1992 ◽
Vol 4
(46)
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pp. 9113-9130
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Keyword(s):
1993 ◽
Vol 68
(3)
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pp. 159-165
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Keyword(s):
1993 ◽
Vol 164-166
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pp. 191-194
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2008 ◽
Vol 354
(19-25)
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pp. 2144-2148
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