Feedback Control Topology of n-DOF Robotic Manipulator and Optimal Positioning of End-Effector using PSO

2020 ◽  
Author(s):  
Soumyendu Banerjee ◽  
Girish K. Singh
Keyword(s):  
Feedback Control ◽  
Robotic Manipulator ◽  
End Effector ◽  
Control Topology

New repetitive motion planning scheme with cube end-effector planning precision for redundant robotic manipulators

Robotica ◽  
2021 ◽  
pp. 1-22
Author(s):  
Limin Shen ◽  
Yuanmei Wen
Keyword(s):  
Theoretical Analysis ◽  
Motion Planning ◽  
Robotic Manipulators ◽  
Robotic Manipulator ◽  
Repetitive Motion ◽  
End Effector ◽  
Difference Formula ◽  
Planning Scheme ◽  
Simulation Results ◽  
The Difference

Abstract Repetitive motion planning (RMP) is important in operating redundant robotic manipulators. In this paper, a new RMP scheme that is based on the pseudoinverse formulation is proposed for redundant robotic manipulators. Such a scheme is derived from the discretization of an existing RMP scheme by utilizing the difference formula. Then, theoretical analysis and results are presented to show the characteristic of the proposed RMP scheme. That is, this scheme possesses the characteristic of cube pattern in the end-effector planning precision. The proposed RMP scheme is further extended and studied for redundant robotic manipulators under joint constraint. Based on a four-link robotic manipulator, simulation results substantiate the effectiveness and superiority of the proposed RMP scheme and its extended one.

On-the-Fly Substrate Eccentricity Recognition for Robotized Manufacturing Systems

2005 ◽  
Vol 127 (1) ◽  
pp. 206-216 ◽  
Author(s):  
Martin Hosek ◽  
Jan Prochazka
Keyword(s):  
Optical Sensors ◽  
Semiconductor Manufacturing ◽  
Manufacturing Systems ◽  
Robotic Manipulator ◽  
End Effector ◽  
Transfer Path ◽  
The Difference ◽  
Manufacturing Applications ◽  
Actual Location

This paper describes a method for on-the-fly determination of eccentricity of a circular substrate, such as a silicon wafer in semiconductor manufacturing applications, carried by a robotic manipulator, where eccentricity refers to the difference between the actual location of the center of the substrate and its desired position on the end-effector of the robotic manipulator. The method utilizes a pair of external optical sensors located along the substrate transfer path. When moving a substrate along the transfer path, the robotic manipulator captures the positions and velocities of the end-effector at which the edges of the substrate are detected by the sensors. These data along with the expected radius of the substrate and the coordinates of the sensors are used to determine the eccentricity of the substrate. This information can be used by the robotic manipulator to compensate for eccentricity of the substrate when performing a place operation, resulting in the substrate being placed centered regardless of the amount and direction of the initial eccentricity. The method can also be employed to detect a defect, such as breakage, of a circular substrate and report an error condition which can abort or otherwise adjust operation of the robotic manipulator.

Development of Path Tracking Control Algorithm for a 4 DOF Spatial Manipulator Using PID Controller

2017 ◽  
pp. 314-327
Author(s):  
Pradeep Reddy Bonikila ◽  
Ravi Kumar Mandava ◽  
Pandu Ranga Vundavilli
Keyword(s):  
Pid Controller ◽  
Dynamic Models ◽  
Control Method ◽  
Robotic Manipulator ◽  
Industrial Applications ◽  
Path Tracking ◽  
End Effector ◽  
Straight Line ◽  
Feedback Control Method ◽  
Manipulator Arm

The path tracking phenomenon of a robotic manipulator arm plays an important role, when the manipulators are used in continuous path industrial applications, such as welding, machining and painting etc. Nowadays, robotic manipulators are extensively used in performing the said tasks in industry. Therefore, it is essential for the manipulator end effector to track the path designed to perform the task in an effective way. In this chapter, an attempt is made to develop a feedback control method for a 4-DOF spatial manipulator to track a path with the help of a PID controller. In order to design the said controller, the kinematic and dynamic models of the robotic manipulator are derived. Further, the concept of inverse kinematics has been used to track different paths, namely a straight line and parabolic paths continuously. The effectiveness of the developed algorithm is tested on a four degree of freedom manipulator arm in simulations.

Task-Space Control Design and Performance Evaluation for a 6DOF Stewart Nanoscale Platform

2008 ◽  
Author(s):  
Chun-Chung Li ◽  
Yung Ting ◽  
Yi-Hung Liu ◽  
Yi-Da Lee ◽  
Chun-Wei Chiu
Keyword(s):  
Feedback Control ◽  
Hybrid Control ◽  
Feedforward Control ◽  
Feedback Controller ◽  
Test Method ◽  
Computation Method ◽  
Task Space ◽  
Force Output ◽  
End Effector ◽  
Control Scheme

A 6DOF Stewart platform using piezoelectric actuators for nanoscale positioning objective is designed. A measurement method that can directly measure the pose (position and orientation) of the end-effector is developed so that task-space on-line control is practicable. The design of a sensor holder for sensor employment, a cuboid with referenced measure points, and the computation method for obtaining the end-effector parameters is introduced. A control scheme combining feedforward and feedback is proposed. The inverse model of a hysteresis model derived by using a dynamic Preisach method is used for the feedforward control. Hybrid control to maintain both the positioning and force output for nano-cutting and nano-assembly applications is designed for the feedback controller. The optimal gain of the feedback controller is searched by using relay feedback test method and genetic algorithm. In experiment, conditions with/without external load employed with feedforward, feedback, and feedforward with feedback control schemes respectively are carried out. Performance of each control scheme verifies the capability of achieving nanoscale precision. The combined feedforward and feedback control scheme is superior to the others for gaining better precision.

scholarly journals Inverse kinematics solution for robotic manipulator based on extreme learning machine and sequential mutation genetic algorithm

2018 ◽  
Vol 15 (4) ◽  
pp. 172988141879299 ◽  
Author(s):  
Zhiyu Zhou ◽  
Hanxuan Guo ◽  
Yaming Wang ◽  
Zefei Zhu ◽  
Jiang Wu ◽  
...  
Keyword(s):  
Genetic Algorithm ◽  
Extreme Learning Machine ◽  
Inverse Kinematics ◽  
Robotic Manipulator ◽  
Computational Time ◽  
Improved Genetic Algorithm ◽  
Intelligent Algorithm ◽  
End Effector ◽  
Training Time ◽  
Learning Machine

This article presents an intelligent algorithm based on extreme learning machine and sequential mutation genetic algorithm to determine the inverse kinematics solutions of a robotic manipulator with six degrees of freedom. This algorithm is developed to minimize the computational time without compromising the accuracy of the end effector. In the proposed algorithm, the preliminary inverse kinematics solution is first computed by extreme learning machine and the solution is then optimized by an improved genetic algorithm based on sequential mutation. Extreme learning machine randomly initializes the weights of the input layer and biases of the hidden layer, which greatly improves the training speed. Unlike classical genetic algorithms, sequential mutation genetic algorithm changes the order of the genetic codes from high to low, which reduces the randomness of mutation operation and improves the local search capability. Consequently, the convergence speed at the end of evolution is improved. The performance of the extreme learning machine and sequential mutation genetic algorithm is also compared with that of a hybrid intelligent algorithm, and the results showed that there is significant reduction in the training time and computational time while the solution accuracy is retained. Based on the experimental results, the proposed extreme learning machine and sequential mutation genetic algorithm can greatly improve the time efficiency while ensuring high accuracy of the end effector.

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