Work-function modulated hetero gate charge plasma TFET to enhance the device performance

2019 ◽  
Author(s):  
Sasmita Sahoo ◽  
Sidhartha Dash ◽  
Guru Prasad Mishra
Keyword(s):  
Work Function ◽  
Device Performance ◽  
Charge Plasma ◽  
Gate Charge

scholarly journals Interplay between Interfacial Structures and Device Performance in Organic Solar Cells: A Case Study with the Low Work Function Metal, Calcium

2016 ◽  
Vol 8 (3) ◽  
pp. 2125-2131 ◽  
Author(s):  
Huanxin Ju ◽  
Kristina M. Knesting ◽  
Wei Zhang ◽  
Xiao Pan ◽  
Chia-Hsin Wang ◽  
...  
Keyword(s):  
Solar Cells ◽  
Work Function ◽  
Organic Solar Cells ◽  
Device Performance ◽  
Interfacial Structures

High-performance dual-gate-charge-plasma-AlGaN/GaN MIS-HEMT

2020 ◽  
Vol 126 (3) ◽  
Author(s):  
Ravi Ranjan ◽  
Nitesh Kashyap ◽  
Ashish Raman
Keyword(s):  
High Performance ◽  
Charge Plasma ◽  
Dual Gate ◽  
Gate Charge

A novel self-aligned charge plasma Schottky barrier tunnel FET using work function engineering

2017 ◽  
Vol 168 ◽  
pp. 67-75 ◽  
Author(s):  
Sangeeta Singh ◽  
Arun Pratap Singh ◽  
P.N. Kondekar
Keyword(s):  
Work Function ◽  
Schottky Barrier ◽  
Charge Plasma ◽  
Tunnel Fet

Spontaneous interlayer formation in OPVs by additive migration due to additive–metal interactions

2014 ◽  
Vol 2 (39) ◽  
pp. 16746-16754 ◽  
Author(s):  
Igal Deckman ◽  
Moshe Moshonov ◽  
Stas Obuchovsky ◽  
Reuven Brener ◽  
Gitti L. Frey
Keyword(s):  
Work Function ◽  
Device Performance ◽  
Metal Interactions ◽  
Metal Work Function ◽  
Organic Electrode ◽  
Electrode Interface ◽  
Metal Work

Additive–metal interactions can induce additive migration to the organic/electrode interface to spontaneously form interlayers that affect the metal work function and enhance OPV device performance.

Sign in / Sign up

Export Citation Format

Share Document