Impact of Work-Function Modulation and Hetero Gate Engineering on Linearity and RF Performance of Charge Plasma TFET

2019 ◽  
Author(s):  
Sasmita Sahoo ◽  
Sidhartha Dash ◽  
Guru Prasad Mishra
Keyword(s):  
Work Function ◽  
Charge Plasma ◽  
Gate Engineering ◽  
Rf Performance

Drain Work Function Engineered Doping-Less Charge Plasma TFET for Ambipolar Suppression and RF Performance Improvement: A Proposal, Design, and Investigation

2016 ◽  
Vol 63 (10) ◽  
pp. 3950-3957 ◽  
Author(s):  
Bhagwan Ram Raad ◽  
Dheeraj Sharma ◽  
Pravin Kondekar ◽  
Kaushal Nigam ◽  
Dharmendra Singh Yadav
Keyword(s):  
Work Function ◽  
Performance Improvement ◽  
Charge Plasma ◽  
Rf Performance

A charge-plasma-based dual-metal-gate recessed-source/drain dopingless junctionless transistor with enhanced analog and RF performance

2020 ◽  
Vol 19 (3) ◽  
pp. 1085-1099
Author(s):  
Prateek Kishor Verma ◽  
Yogesh Kumar Verma ◽  
Varun Mishra ◽  
Santosh Kumar Gupta
Keyword(s):  
Metal Gate ◽  
Charge Plasma ◽  
Junctionless Transistor ◽  
Dual Metal ◽  
Rf Performance ◽  
A Charge

Comparative investigation of novel hetero gate dielectric and drain engineered charge plasma TFET for improved DC and RF performance

2017 ◽  
Vol 111 ◽  
pp. 123-133 ◽  
Author(s):  
Dharmendra Singh Yadav ◽  
Abhishek Verma ◽  
Dheeraj Sharma ◽  
Sukeshni Tirkey ◽  
Bhagwan Ram Raad
Keyword(s):  
Gate Dielectric ◽  
Comparative Investigation ◽  
Charge Plasma ◽  
Rf Performance

Dielectric and work function engineered TFET for ambipolar suppression and RF performance enhancement

2016 ◽  
Vol 52 (9) ◽  
pp. 770-772 ◽  
Author(s):  
B. Raad ◽  
K. Nigam ◽  
D. Sharma ◽  
P. Kondekar
Keyword(s):  
Work Function ◽  
Performance Enhancement ◽  
Rf Performance

A novel self-aligned charge plasma Schottky barrier tunnel FET using work function engineering

2017 ◽  
Vol 168 ◽  
pp. 67-75 ◽  
Author(s):  
Sangeeta Singh ◽  
Arun Pratap Singh ◽  
P.N. Kondekar
Keyword(s):  
Work Function ◽  
Schottky Barrier ◽  
Charge Plasma ◽  
Tunnel Fet

A Barrier Controlled Charge Plasma-Based TFET With Gate Engineering for Ambipolar Suppression and RF/Linearity Performance Improvement

2017 ◽  
Vol 64 (6) ◽  
pp. 2751-2757 ◽  
Author(s):  
Kaushal Nigam ◽  
Sunil Pandey ◽  
Pravin N. Kondekar ◽  
Dheeraj Sharma ◽  
Pawan Kumar Parte
Keyword(s):  
Performance Improvement ◽  
Charge Plasma ◽  
Gate Engineering
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