Design and optimization of dual-spot size optical systems for medical lasers

Author(s):  
Marcel Isper ◽  
Nicolas Kudsieh ◽  
Matthew Boyd
Micromachines ◽  
2021 ◽  
Vol 12 (2) ◽  
pp. 116
Author(s):  
Julian Deuerling ◽  
Shaun Keck ◽  
Inasya Moelyadi ◽  
Jens-Uwe Repke ◽  
Matthias Rädle

This work presents a novel method for the non-invasive, in-line monitoring of mixing processes in microchannels using the Raman photometric technique. The measuring set-up distinguishes itself from other works in this field by utilizing recent state-of-the-art customized photon multiplier (CPM) detectors, bypassing the use of a spectrometer. This addresses the limiting factor of integration times by achieving measuring rates of 10 ms. The method was validated using the ternary system of toluene–water–acetone. The optical measuring system consists of two functional units: the coaxial Raman probe optimized for excitation at a laser wavelength of 532 nm and the photometric detector centered around the CPMs. The spot size of the focused laser is a defining factor of the spatial resolution of the set-up. The depth of focus is measured at approx. 85 µm with a spot size of approx. 45 µm, while still maintaining a relatively high numerical aperture of 0.42, the latter of which is also critical for coaxial detection of inelastically scattered photons. The working distance in this set-up is 20 mm. The microchannel is a T-junction mixer with a square cross section of 500 by 500 µm, a hydraulic diameter of 500 µm and 70 mm channel length. The extraction of acetone from toluene into water is tracked at an initial concentration of 25% as a function of flow rate and accordingly residence time. The investigated flow rates ranged from 0.1 mL/min to 0.006 mL/min. The residence times from the T-junction to the measuring point varies from 1.5 to 25 s. At 0.006 mL/min a constant acetone concentration of approx. 12.6% was measured, indicating that the mixing process reached the equilibrium of the system at approx. 12.5%. For prototype benchmarking, comparative measurements were carried out with a commercially available Raman spectrometer (RXN1, Kaiser Optical Systems, Ann Arbor, MI, USA). Count rates of the spectrophotometer surpassed those of the spectrometer by at least one order of magnitude at identical target concentrations and optical power output. The experimental data demonstrate the suitability and potential of the new measuring system to detect locally and time-resolved concentration profiles in moving fluids while avoiding external influence.


2008 ◽  
Vol 580-582 ◽  
pp. 459-462 ◽  
Author(s):  
Joo Han Kim ◽  
Hyang Tae Kim ◽  
Chul Ku Lee

UV curing adhesives have been introduced for bonding various materials at a room temperature. It has the advantage of putting minimum thermal load on the system; however, it is not suitable for precision bonding of micro systems such as micro optical devices because of its high viscosity and poor control of the UV light source. In the present work, a laser-curing bonding process of micro optical devices with a low-viscosity UV polymer adhesive has been developed. A focused Nd:YVO4 laser beam with a spot size of 30 µm with a laser power of 100 ~ 700 mW is used for curing a UV adhesive locally. A thin bonding layer with a thickness of a few hundred nanometers without any thermal effects can be obtained for precision laser bonding for optical fibers. Experimental results are provided and the process characteristics have been discussed. Moreover, potential applications in the field of micro optical systems are introduced as well.


2020 ◽  
Vol 27 (6) ◽  
pp. 1477-1484
Author(s):  
Yiqing Cao ◽  
Zhijuan Shen ◽  
Haihe Xie

A third-order aberration analytical analysis method of soft X-ray optical systems with orthogonal and coplanar arrangement of the main planes of elements is proposed. Firstly, the transfer equations of the aperture ray and the principle ray are derived; then, based on the third-order aberration theory with the aperture-ray coordinates on the reference exit wavefront of a plane-symmetric optical system, the aberration expressions contributed by the wave aberration and defocus of this kind of optical system are studied in detail. Finally, the derived aberration calculation expressions are applied to calculate the aberration of two design examples of such types of optical systems; the images are compared with ray-tracing results obtained using the Shadow software to validate the aberration expressions. The study shows that the accuracy of the aberration expressions is satisfactory. The analytical analysis method of aberration is helpful in the design and optimization of the soft X-ray optical systems with orthogonal and coplanar arrangement of the main planes of optical elements.


Coatings ◽  
2018 ◽  
Vol 8 (9) ◽  
pp. 308 ◽  
Author(s):  
Haolong Tang ◽  
Jinsong Gao ◽  
Jian Zhang ◽  
Xiaoyi Wang ◽  
Xiuhua Fu

To meet the requirements for lightweight, miniaturized dispersive optical systems for space applications, linear variable filters with a high transmittance and spatial dispersion coefficient are proposed. The filters were produced with dual ion beam sputtering, where a single layer thickness variation was achieved with a deposition rate adjustment based on a linear variable correction formula. A linear variable trend matching method was used to correct the film thickness based on the reduction of the mismatch error between two materials: Ta2O5 and SiO2. The influence of the spectral and spatial measuring average effects was addressed by sampling the spot size optimization. This paper presents an all-dielectric linear variable filter that operates between 520 and 1000 nm, with an excellent linear dependence of 40 nm/mm over 12 mm. The linear variable filter possessed a 2.5% bandwidth, and its transmittance was found to be >80% at the central wavelength of the band, with a 0.1% transmittance in the cut-off region. These results indicate great potential for optical devices for space applications, and the developed process has good reproducibility and stability.


Author(s):  
TJ. Stark ◽  
Z. J. Radzimski ◽  
P.A. Peterson ◽  
D.P. Griffis ◽  
P. E. Russell

Recent advances in electron optical systems which allow reduction of electron beam voltage while maintaining sufficiently small spot size and high current density have opened new possibilities for electron beam lithography. The main advantage of low beam energy lithography is a reduction of backscattered electrons and, consequently, the reduction of problems associated with proximity effects. The other advantages of this technique are reduction in the dose required to modify a resist and minimization of substrate damage caused by energetic electrons. Proper electron energy must be chosen at which the beam deposits its energy mainly within the resist film with minimal penetration into the substrate. Monte Carlo simulation programs have been used widely to predict the scattering interactions and thus the area of proximity effects. Rutherford cross section for angle scattering and Bethe energy loss have been commonly used in Monte Carlo modeling. However, low energy lithography (<5keV) requires a more accurate approach based on Mott cross sections for scattering and a more precise formula for energy loss replacing the Bethe law which is invalid below 1 keV energy.


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