Growth of Single Crystalline c-In2O3(111) Layers on Off-Axis c-Plane Sapphire Substrates by Halide Vapor Phase Epitaxy

2019 ◽  
Author(s):  
Yuya Saimoto ◽  
Kenta Nagai ◽  
Hidetoshi Nakahata ◽  
Keita Konishi ◽  
Yoshinao Kumagai
Keyword(s):  
Vapor Phase ◽  
Vapor Phase Epitaxy ◽  
Single Crystalline ◽  
Sapphire Substrates

scholarly journals Hydride Vapor-Phase Epitaxy of c-Plane AlGaN Layers on Patterned Sapphire Substrates

2013 ◽  
Vol 43 (4) ◽  
pp. 814-818 ◽  
Author(s):  
E. Richter ◽  
S. Fleischmann ◽  
D. Goran ◽  
S. Hagedorn ◽  
W. John ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Vapor Phase Epitaxy ◽  
Hydride Vapor Phase Epitaxy ◽  
Sapphire Substrates ◽  
Patterned Sapphire Substrates

High Quality AlN Layer Grown on Patterned Sapphire Substrates by Hydride Vapor-Phase Epitaxy: A Route for Cost Efficient AlN Templates for Deep Ultraviolet Light Devices

2021 ◽  
Vol 21 (9) ◽  
pp. 4881-4885
Author(s):  
Seung-Jae Lee ◽  
Seong-Ran Jeon ◽  
Young Ho Song ◽  
Young-Jun Choi ◽  
Hae-Gon Oh ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Vapor Phase Epitaxy ◽  
Hydride Vapor Phase Epitaxy ◽  
Threading Dislocation ◽  
Sapphire Substrates ◽  
Transmission Electron ◽  
Dislocation Densities ◽  
Order Of Magnitude ◽  
Cost Efficient ◽  
Patterned Sapphire Substrates

We report the characteristics of AlN epilayers grown directly on cylindrical-patterned sapphire substrates (CPSS) by hydride vapor-phase epitaxy (HVPE). To evaluate the effect of CPSS, we analyzed the threading dislocation densities (TDDs) of AlN films grown simultaneously on CPSS and flat sapphire substrate (FSS) by transmission electron microscopy (TEM). The corresponding TDD is measured to be 5.69 x 108 cm−2 for the AlN sample grown on the CPSS that is almost an order of magnitude lower than the value of 3.43 × 109 cm−2 on the FSS. The CPSS contributes to reduce the TDs originated from the AlN/sapphire interface via bending the TDs by lateral growth during the coalescence process. In addition, the reduction of direct interface area between AlN and sapphire by CPSS reduce the generation of TDs.

scholarly journals Reduction of Defects in AlGaN Grown on Nanoscale-Patterned Sapphire Substrates by Hydride Vapor Phase Epitaxy

Materials ◽  
2017 ◽  
Vol 10 (6) ◽  
pp. 605 ◽  
Author(s):  
Chi-Tsung Tasi ◽  
Wei-Kai Wang ◽  
Tsung-Yen Tsai ◽  
Shih-Yung Huang ◽  
Ray-Hua Horng ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Vapor Phase Epitaxy ◽  
Hydride Vapor Phase Epitaxy ◽  
Sapphire Substrates ◽  
Patterned Sapphire Substrates

Halide Vapor Phase Epitaxy α‐ and ε‐Ga 2 O 3 Epitaxial Films Grown on Patterned Sapphire Substrates

2020 ◽  
Vol 217 (14) ◽  
pp. 1900892 ◽  
Author(s):  
Sevastian Shapenkov ◽  
Oleg Vyvenko ◽  
Evgeny Ubyivovk ◽  
Oleg Medvedev ◽  
Georgiy Varygin ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Epitaxial Films ◽  
Vapor Phase Epitaxy ◽  
Sapphire Substrates ◽  
Patterned Sapphire Substrates

scholarly journals GaN Single Crystalline Substrates by Ammonothermal and HVPE Methods for Electronic Devices

Electronics ◽  
2020 ◽  
Vol 9 (9) ◽  
pp. 1342
Author(s):  
Karolina Grabianska ◽  
Piotr Jaroszynski ◽  
Aneta Sidor ◽  
Michal Bockowski ◽  
Malgorzata Iwinska
Keyword(s):  
Vapor Phase ◽  
Grown Crystal ◽  
Electronic Devices ◽  
Vapor Phase Epitaxy ◽  
Single Crystalline ◽  
Bulk Growth ◽  
The World ◽  
The Way

Recent results of GaN bulk growth performed in Poland are presented. Two technologies are described in detail: halide vapor phase epitaxy and basic ammonothermal. The processes and their results (crystals and substrates) are demonstrated. Some information about wafering procedures, thus, the way from as-grown crystal to an epi-ready wafer, are shown. Results of other groups in the world are briefly presented as the background for our work.

Influence of source gas supply sequence on hydride vapor phase epitaxy of AlN on (0001) sapphire substrates

2012 ◽  
Vol 360 ◽  
pp. 197-200 ◽  
Author(s):  
Rie Togashi ◽  
Toru Nagashima ◽  
Manabu Harada ◽  
Hisashi Murakami ◽  
Yoshinao Kumagai ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Vapor Phase Epitaxy ◽  
Hydride Vapor Phase Epitaxy ◽  
Sapphire Substrates ◽  
Gas Supply

scholarly journals Development of β-Ga2O3 layers growth on sapphire substrates employing modeling of precursors ratio in halide vapor phase epitaxy reactor

2020 ◽  
Vol 10 (1) ◽  
Author(s):  
Galia Pozina ◽  
Chih-Wei Hsu ◽  
Natalia Abrikossova ◽  
Mikhail A. Kaliteevski ◽  
Carl Hemmingsson
Keyword(s):  
Band Gap ◽  
Vapor Phase ◽  
Wide Band ◽  
Band Gap Energy ◽  
Vapor Phase Epitaxy ◽  
Structural Quality ◽  
Wide Band Gap ◽  
Vacancy Defects ◽  
Sapphire Substrates ◽  
Efficient Power

AbstractGallium oxide is a promising semiconductor with great potential for efficient power electronics due to its ultra-wide band gap and high breakdown electric field. Optimization of halide vapor phase epitaxy growth of heteroepitaxial $$\upbeta$$ β -Ga2O3 layers is demonstrated using a simulation model to predict the distribution of the ratio of gallium to oxygen precursors inside the reactor chamber. The best structural quality is obtained for layers grown at 825–850 °C and with a III/VI precursor ratio of 0.2. Although the structural and optical properties are similar, the surface morphology is more deteriorated for the $$\upbeta$$ β -Ga2O3 layers grown on 5 degree off-axis sapphire substrates compared to on-axis samples even for optimized process parameters. Cathodoluminescence with a peak at 3.3 eV is typical for unintentionally doped n-type $$\upbeta$$ β -Ga2O3 and shows the appearance of additional emissions in blue and green region at ~ 3.0, ~ 2.8, ~ 2.6 and ~ 2.4 eV, especially when the growth temperatures is lowered to 800–825 °C. Estimation of the band gap energy to ~ 4.65 eV from absorption indicates a high density of vacancy defects.

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