Room temperature plasma oxidation (RTPO): a new approach to obtain ultrathin layers of SiO/sub 2/ and high K dielectrics

2005 ◽  
Author(s):  
M. Estrada ◽  
J.C. Tinoco ◽  
A. Cerdeira
Keyword(s):  
Room Temperature ◽  
Plasma Oxidation ◽  
Temperature Plasma ◽  
New Approach ◽  
High K ◽  
Ultrathin Layers

Room temperature plasma oxidation in DCSBD: A new method for preparation of silicon dioxide films at atmospheric pressure

2013 ◽  
Vol 178 (9) ◽  
pp. 651-655 ◽  
Author(s):  
Dana Skácelová ◽  
Vladimir Danilov ◽  
Jan Schäfer ◽  
Antje Quade ◽  
Pavel Sťahel ◽  
...  
Keyword(s):  
Silicon Dioxide ◽  
Atmospheric Pressure ◽  
Room Temperature ◽  
New Method ◽  
Plasma Oxidation ◽  
Temperature Plasma ◽  
Silicon Dioxide Films
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