Plasma process control with optical emission spectroscopy

Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future' ◽

10.1109/iemt.1995.526109 ◽

2002 ◽

Author(s):

P.P. Ward

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

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Intelligent process control of indium tin oxide sputter deposition using optical emission spectroscopy

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581572 ◽

1999 ◽

Vol 17 (1) ◽

pp. 190-197 ◽

Author(s):

I. L. Eisgruber ◽

J. R. Engel ◽

R. E. Hollingsworth ◽

P. K. Bhat ◽

R. Wendt

Keyword(s):

Process Control ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Sputter Deposition ◽

Intelligent Process ◽

Intelligent Process Control

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Estimation of Process Time Delay between Chamber Measurements and Optical Emission Spectroscopy : APC: Advanced Process Control

2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) ◽

10.1109/asmc49169.2020.9185298 ◽

2020 ◽

Author(s):

Taikang Ning ◽

C.H. Huang ◽

J.A. Jensen ◽

V. Wong ◽

H. Chan

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Process Time ◽

Advanced Process Control ◽

Chamber Measurements

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A Study on the Optical Emission Spectroscopy of the RF Inductive Plasma Process

Journal of the Korean Institute of Illuminating and Electrical Installation Engineers ◽

10.5207/jieie.2011.25.11.103 ◽

2011 ◽

Vol 25 (11) ◽

pp. 103-112

Author(s):

Mun-Gug Jang ◽

Sang-Bo Han ◽

Sang-Hyun Park

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

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Process control by optical emission spectroscopy during growth of a-C: H from a CH4 plasma by plasma-enhanced chemical vapour deposition

Surface and Coatings Technology ◽

10.1016/0257-8972(94)90241-0 ◽

1994 ◽

Vol 68-69 ◽

pp. 702-707 ◽

Author(s):

C. Barholm-Hansen ◽

M.D. Bentzon ◽

M.E. Vigild ◽

E. Findeisen ◽

R. Feidenhans'l ◽

...

Keyword(s):

Process Control ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Emission

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Process control with optical emission spectroscopy in triode ion plating

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.572882 ◽

1985 ◽

Vol 3 (6) ◽

pp. 2364-2367 ◽

Author(s):

K. Salmenoja ◽

A. S. Korhonen ◽

M. S. Sulonen

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

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The use of optical emission spectroscopy for process control in triode ion plating with ZrN

Vacuum ◽

10.1016/0042-207x(86)90265-4 ◽

1986 ◽

Vol 36 (1-3) ◽

pp. 33-35 ◽

Author(s):

K Salmenoja ◽

AS Korhonen

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

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Plasma Process Uniformity Diagnosis Technique Using Optical Emission Spectroscopy With Spatially Resolved Ring Lens

IEEE Transactions on Industrial Electronics ◽

10.1109/tie.2016.2571261 ◽

2016 ◽

Vol 63 (9) ◽

pp. 5674-5681 ◽

Author(s):

In Joong Kim ◽

Ilgu Yun

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Plasma Process ◽

Spatially Resolved ◽

Process Uniformity ◽

Diagnosis Technique

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Analysis on steady plasma process of high-rate microcrystalline silicon by optical emission spectroscopy

Acta Physica Sinica ◽

10.7498/aps.62.168103 ◽

2013 ◽

Vol 62 (16) ◽

pp. 168103

Author(s):

Fang Jia ◽

Li Shuang-Liang ◽

Xu Sheng-Zhi ◽

Wei Chang-Chun ◽

Zhao Ying ◽

...

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

High Rate ◽

Plasma Process ◽

Microcrystalline Silicon

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Development of advanced plasma process with an optical emission spectroscopy-based end-point technique for etching of AlGaAs over GaAs in manufacture of heterojunction bipolar transistors

Solid-State Electronics ◽

10.1016/s0038-1101(01)00171-x ◽

2002 ◽

Vol 46 (5) ◽

pp. 773-775 ◽

Author(s):

J.W. Lee ◽

M.H. Jeon ◽

G.S. Cho ◽

H.C. Yim ◽

S.K. Chang ◽

...

Keyword(s):

Heterojunction Bipolar Transistors ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Bipolar Transistors ◽

Plasma Process ◽

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Process control of high rate microcrystalline silicon based solar cell deposition by optical emission spectroscopy

Thin Solid Films ◽

10.1016/j.tsf.2007.05.098 ◽

2008 ◽

Vol 516 (14) ◽

pp. 4633-4638 ◽

Author(s):

T. Kilper ◽

M.N. van den Donker ◽

R. Carius ◽

B. Rech ◽

G. Bräuer ◽

...

Keyword(s):

Process Control ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

High Rate ◽

Microcrystalline Silicon ◽

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