Yield characterization of high-current ion implantation particles on 65 nm CMOS transistors

2007 ◽  
Author(s):  
Brian Whitson ◽  
Aaron Vanderpool
Keyword(s):  
Ion Implantation ◽  
High Current ◽  
Cmos Transistors

Process Characterization Of Low Temperature Ion Implantation Using Ribbon Beam And Spot Beam On The AIBT iPulsar High Current

2011 ◽  
Author(s):  
Erik J. H. Collart ◽  
Ron Teel ◽  
Charles Free ◽  
Zhimin Wan ◽  
Peter Kopalidis ◽  
...  
Keyword(s):  
Low Temperature ◽  
Ion Implantation ◽  
High Current ◽  
Process Characterization ◽  
Ribbon Beam ◽  
Spot Beam

Optical, electrical, and chemical characterization of nanostructured InxGa1-xN formed by high fluence In+ ion implantation into GaN

2020 ◽  
pp. 110541
Author(s):  
C.A. Hernández-Gutiérrez ◽  
Yuriy Kudriavtsev ◽  
Dagoberto Cardona ◽  
A.G. Hernández ◽  
J.L. Camas-Anzueto
Keyword(s):  
Ion Implantation ◽  
Chemical Characterization ◽  
High Fluence

Fourier transform infra-red characterization of carbon onions produced by carbon-ion implantation

1998 ◽  
Vol 285 (3-4) ◽  
pp. 216-220 ◽  
Author(s):  
T. Cabioc'h ◽  
A. Kharbach ◽  
A. Le Roy ◽  
J.P. Rivière
Keyword(s):  
Fourier Transform ◽  
Ion Implantation ◽  
Carbon Ion ◽  
Infra Red ◽  
Carbon Onions

scholarly journals A broad-beam, high-current metal-ion implantation facility

1991 ◽  
Vol 55 (1-4) ◽  
pp. 506-510 ◽  
Author(s):  
I.G. Brown ◽  
M.R. Dickinson ◽  
J.E. Galvin ◽  
X. Godechot ◽  
R.A. MacGill
Keyword(s):  
Ion Implantation ◽  
Metal Ion ◽  
High Current ◽  
Broad Beam ◽  
Metal Ion Implantation
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