AlGaN-GaN Metal-Insulator-Semiconductor High-Electron-Mobility Transistors With Very High- $k$ Oxynitride $\hbox{TaO}_{x} \hbox{N}_{y}$ Gate Dielectric

2013 ◽  
Vol 34 (3) ◽  
pp. 375-377 ◽  
Author(s):  
Taku Sato ◽  
Junich Okayasu ◽  
Masahiko Takikawa ◽  
Toshi-kazu Suzuki
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