Characterization of LOCOS Field Oxide on 4H-SiC Formed by Ar Preamorphization Ion Implantation

2017 ◽  
Vol 38 (6) ◽  
pp. 798-801 ◽  
Author(s):  
Yuan-Hung Tseng ◽  
Chung-Yu Lin ◽  
Bing-Yue Tsui
Keyword(s):  
Ion Implantation ◽  
Field Oxide

Optical, electrical, and chemical characterization of nanostructured InxGa1-xN formed by high fluence In+ ion implantation into GaN

2020 ◽  
pp. 110541
Author(s):  
C.A. Hernández-Gutiérrez ◽  
Yuriy Kudriavtsev ◽  
Dagoberto Cardona ◽  
A.G. Hernández ◽  
J.L. Camas-Anzueto
Keyword(s):  
Ion Implantation ◽  
Chemical Characterization ◽  
High Fluence

Fourier transform infra-red characterization of carbon onions produced by carbon-ion implantation

1998 ◽  
Vol 285 (3-4) ◽  
pp. 216-220 ◽  
Author(s):  
T. Cabioc'h ◽  
A. Kharbach ◽  
A. Le Roy ◽  
J.P. Rivière
Keyword(s):  
Fourier Transform ◽  
Ion Implantation ◽  
Carbon Ion ◽  
Infra Red ◽  
Carbon Onions

Characterization of tunnel-oxide degradation due to plasma field oxide recess in flash memory devices

2012 ◽  
Vol 520 (15) ◽  
pp. 5007-5010 ◽  
Author(s):  
Jeungyun Lee ◽  
Dong-Kwon Kim ◽  
Gyung-Jin Min ◽  
Ilsub Chung
Keyword(s):  
Flash Memory ◽  
Memory Devices ◽  
Oxide Degradation ◽  
Field Oxide

Electrical and optical characterization of defect levels caused in InGaAs by boron ion implantation

1993 ◽  
Vol 80-81 ◽  
pp. 632-635
Author(s):  
Shin'ichi Yamamura ◽  
Tadamasa Kimura ◽  
Shigemi Yugo ◽  
Riichiro Saito ◽  
Michio Murata ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Optical Characterization ◽  
Defect Levels

Creation and Characterization of Buried Microstructures in Diamond by Ion Implantation

2006 ◽  
Author(s):  
M.A. Draganskia ◽  
P. Olivero ◽  
S. Rubanov ◽  
P. Spizziri ◽  
P.N. Johnston ◽  
...  
Keyword(s):  
Ion Implantation

Characterization of a Thermal Oxidation Process on SiC Preamorphized by Ar Ion Implantation

2004 ◽  
Vol 457-460 ◽  
pp. 1357-1360 ◽  
Author(s):  
Antonella Poggi ◽  
Roberta Nipoti ◽  
Sandro Solmi ◽  
M. Bersani ◽  
L. Vanzetti
Keyword(s):  
Ion Implantation ◽  
Thermal Oxidation ◽  
Oxidation Process ◽  
Thermal Oxidation Process

Characterization of Ion Implantation Damage in Capless Annealed GaAs

1983 ◽  
Vol 27 ◽  
Author(s):  
H. Kanber ◽  
M. Feng ◽  
J. M. Whelan
Keyword(s):  
Ion Implantation ◽  
Annealing Temperature ◽  
Rutherford Backscattering ◽  
Buffer Layers ◽  
Electrical Activation ◽  
Controlled Atmosphere ◽  
Damage Characteristics ◽  
Implantation Damage ◽  
Implantation Process

ABSTRACTArsenic and argon implantation damage is characterized by Rutherford backscattering in GaAs undoped VPE buffer layers grown on Cr-O doped semi-insulating substrates and capless annealed in a H2 −As4 atmosphere provided by AsH3. The damage detected in the RBS channeled spectra varies as a function of the ion mass, the implant depth and the annealing temperature of the stress-free controlled atmosphere technique. This damage is discussed in terms of the stoichiometric disturbances introduced by the implantation process. The as-implanted and annealed damage characteristics of the Ar and As implants are correlated to the electrical activation characteristics of Si and Se implants in GaAs, respectively.

Characterization of high energy ion implantation into Ti–6Al–4V

2009 ◽  
Vol 389 (2) ◽  
pp. 248-253 ◽  
Author(s):  
M.P. Carroll ◽  
K. Stephenson ◽  
K.O. Findley
Keyword(s):  
Ion Implantation ◽  
High Energy
Sign in / Sign up

Export Citation Format

Share Document