An adaptive octree level set simulation method of the wet etching process for the fabrication of micro structure on sapphire crystal

2021 ◽  
Author(s):  
Ye Chen ◽  
Jin Qian ◽  
Xinyan Guo ◽  
Yan Xing
Keyword(s):  
Level Set ◽  
Simulation Method ◽  
Wet Etching ◽  
Etching Process ◽  
Sapphire Crystal ◽  
Micro Structure

Fabrication of micro-structure on glass surface using micro-indentation and wet etching process

2008 ◽  
Vol 254 (22) ◽  
pp. 7243-7249 ◽  
Author(s):  
Yasuhiro Saito ◽  
Shinya Okamoto ◽  
Atsushi Miki ◽  
Hiroyuki Inomata ◽  
Takeshi Hidaka ◽  
...  
Keyword(s):  
Glass Surface ◽  
Wet Etching ◽  
Etching Process ◽  
Micro Structure ◽  
Micro Indentation

Photosensitive terpolymer for all-wet-etching process: Material characterization and device fabrication

2010 ◽  
Vol 518 (8) ◽  
pp. 2147-2151
Author(s):  
Abderrafia Moujoud ◽  
Sungho Kang ◽  
Hyun Jae Kim ◽  
Mark Andrews
Keyword(s):  
Material Characterization ◽  
Device Fabrication ◽  
Wet Etching ◽  
Etching Process ◽  
Process Material

A Cartesian Explicit Solver for Complex Hydrodynamic Applications

2014 ◽  
Author(s):  
P. Bigay ◽  
A. Bardin ◽  
G. Oger ◽  
D. Le Touzé
Keyword(s):  
Level Set ◽  
Incompressible Flows ◽  
Stokes Equations ◽  
Simulation Method ◽  
Navier Stokes ◽  
Viscous Effects ◽  
Navier Stokes Equations ◽  
Eddy Simulation ◽  
Flow Past A Cylinder ◽  
Explicit Solver

In order to efficiently address complex problems in hydrodynamics, the advances in the development of a new method are presented here. This method aims at finding a good compromise between computational efficiency, accuracy, and easy handling of complex geometries. The chosen method is an Explicit Cartesian Finite Volume method for Hydrodynamics (ECFVH) based on a compressible (hyperbolic) solver, with a ghost-cell method for geometry handling and a Level-set method for the treatment of biphase-flows. The explicit nature of the solver is obtained through a weakly-compressible approach chosen to simulate nearly-incompressible flows. The explicit cell-centered resolution allows for an efficient solving of very large simulations together with a straightforward handling of multi-physics. A characteristic flux method for solving the hyperbolic part of the Navier-Stokes equations is used. The treatment of arbitrary geometries is addressed in the hyperbolic and viscous framework. Viscous effects are computed via a finite difference computation of viscous fluxes and turbulent effects are addressed via a Large-Eddy Simulation method (LES). The Level-Set solver used to handle biphase flows is also presented. The solver is validated on 2-D test cases (flow past a cylinder, 2-D dam break) and future improvements are discussed.

LiTaO3 Recording Media Prepared by Polarization Controlled Wet Etching Process

2004 ◽  
Vol 68 (1) ◽  
pp. 221-228
Author(s):  
YOSHIOMI HIRANAGA ◽  
YASUO WAGATSUMA ◽  
YASUO CHO
Keyword(s):  
Wet Etching ◽  
Etching Process ◽  
Recording Media

scholarly journals The Level-Set Method for Multi-Material Wet Etching and Non-Planar Selective Epitaxy

IEEE Access ◽  
2020 ◽  
Vol 8 ◽  
pp. 115406-115422
Author(s):  
Alexander Toifl ◽  
Michael Quell ◽  
Xaver Klemenschits ◽  
Paul Manstetten ◽  
Andreas Hossinger ◽  
...  
Keyword(s):  
Level Set Method ◽  
Level Set ◽  
Wet Etching ◽  
Selective Epitaxy

Novel method of fabricating Fabry-Perot cavity employing MEMS wet-etching process

2004 ◽  
Author(s):  
Min Xiang ◽  
Yanmin Cai ◽  
Yaming Wu ◽  
Jianyi Yang ◽  
Yuelin Wang
Keyword(s):  
Wet Etching ◽  
Etching Process ◽  
Fabry Perot ◽  
Novel Method

Characteristics on the Gate Insulator of Metal Tip Field Emitter Arrays after Wet Etching Process

1997 ◽  
Vol 36 (Part 1, No. 6A) ◽  
pp. 3576-3579
Author(s):  
Yu Ho Jung ◽  
Byeong Kwon Ju ◽  
Jae Hoon Jung ◽  
Yun Hi Lee ◽  
Myung Hwan Oh ◽  
...  
Keyword(s):  
Wet Etching ◽  
Etching Process ◽  
Gate Insulator ◽  
Field Emitter ◽  
Field Emitter Arrays ◽  
Metal Tip
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