Microwave oscillation in a recirculating planar magnetron

2012 Abstracts IEEE International Conference on Plasma Science ◽

10.1109/plasma.2012.6384023 ◽

2012 ◽

Author(s):

M. Franzi ◽

R. M. Gilgenbach ◽

Yue-Ying Lau ◽

D. Chalenski ◽

D. M. French ◽

...

Keyword(s):

Microwave Oscillation ◽

Planar Magnetron

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Microwave oscillation, mode control and extraction in the recirculating planar magnetron

2013 Abstracts IEEE International Conference on Plasma Science (ICOPS) ◽

10.1109/plasma.2013.6633278 ◽

2013 ◽

Author(s):

Matthew Franzi ◽

Ronald M. Gilgenbach ◽

Brad W. Hoff ◽

Y. Y. Lau ◽

Geoff Greening ◽

...

Keyword(s):

Oscillation Mode ◽

Microwave Oscillation ◽

Mode Control ◽

Planar Magnetron

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Hard carbon and composite metal/hard carbon films prepared by a dc unbalanced planar magnetron

Vacuum ◽

10.1016/0042-207x(90)90039-2 ◽

1990 ◽

Vol 40 (3) ◽

pp. 251-255 ◽

Author(s):

H Biederman ◽

K Kohoutek ◽

Z Chmel ◽

V Stary ◽

RP Howson

Keyword(s):

Carbon Films ◽

Hard Carbon ◽

Planar Magnetron

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7175. Preparation of AIN films by planar magnetron sputtering system with facing two targets

Vacuum ◽

10.1016/0042-207x(91)90982-o ◽

1991 ◽

Vol 42 (8-9) ◽

pp. 567

Keyword(s):

Magnetron Sputtering ◽

Planar Magnetron ◽

Sputtering System

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Effect of pressure on dc planar magnetron sputtering of platinum

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1564027 ◽

2003 ◽

Vol 21 (3) ◽

pp. 572-576 ◽

Author(s):

John H. Thomas

Keyword(s):

Magnetron Sputtering ◽

Effect Of Pressure ◽

Planar Magnetron

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Effect of process parameters on properties of YBCO thin films deposited by off-axis planar magnetron sputtering

10.1063/1.43585 ◽

1992 ◽

Author(s):

M. Ihsan ◽

M. Fardmanesh ◽

A. Rothwarf ◽

K. Pourrezaei

Keyword(s):

Magnetron Sputtering ◽

Process Parameters ◽

Ybco Thin Films ◽

Planar Magnetron

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High-Power Microwave Oscillation of a 94 GHz Gyrotron for Air-Breakdown Plasma Observations in Microwave Rocket

10.1109/irmmw-thz50926.2021.9567447 ◽

2021 ◽

Author(s):

K. Tabata ◽

A. Manabe ◽

K. Komurasaki ◽

T. Kariya ◽

R. Minami ◽

...

Keyword(s):

Microwave Oscillation ◽

High Power Microwave ◽

Air Breakdown ◽

Power Microwave ◽

Breakdown Plasma

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Optical properties of GAZO thin films deposited by RF planar magnetron sputtering at various O2/Ar flow ratios

Optics & Laser Technology ◽

10.1016/j.optlastec.2018.09.032 ◽

2019 ◽

Vol 111 ◽

pp. 25-29

Author(s):

E. Muchuweni ◽

T.S. Sathiaraj ◽

H. Nyakotyo

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Planar Magnetron

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Copper Filling of Deep Sub-µm Through-Holes by High-Vacuum Planar Magnetron Sputtering Using Argon Gas with Added Nitrogen: Optimum Quantity of Nitrogen in Argon Gas

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.736 ◽

2006 ◽

Vol 45 (2A) ◽

pp. 736-738 ◽

Author(s):

Shigeru Saito ◽

Yoshio Uhara ◽

Takahide Uenosono ◽

Jyunichi Nagata ◽

Minemasa Oyama ◽

...

Keyword(s):

Magnetron Sputtering ◽

High Vacuum ◽

Argon Gas ◽

Optimum Quantity ◽

Planar Magnetron

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Simulation and analysis of a reentrant planar magnetron

10.1109/iedm.1987.191376 ◽

1987 ◽

Author(s):

L.D. Ludeking ◽

G.E. Thomas ◽

W.M. Bollen

Keyword(s):

Planar Magnetron

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Effect of plasma properties on the preparation of tin oxide thin film by means of DC planar magnetron plasma CVD

Electronics and Communications in Japan (Part II Electronics) ◽

10.1002/ecjb.4420710906 ◽

1988 ◽

Vol 71 (9) ◽

pp. 49-57

Author(s):

Hiroharu Fujita ◽

Hironobu Ueno ◽

Masamitsu Nagano ◽

Hisao Matsuo

Keyword(s):

Thin Film ◽

Tin Oxide ◽

Oxide Thin Film ◽

Plasma Properties ◽

Planar Magnetron

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