Copper Filling of Deep Sub-µm Through-Holes by High-Vacuum Planar Magnetron Sputtering Using Argon Gas with Added Nitrogen: Optimum Quantity of Nitrogen in Argon Gas

2006 ◽  
Vol 45 (2A) ◽  
pp. 736-738 ◽  
Author(s):  
Shigeru Saito ◽  
Yoshio Uhara ◽  
Takahide Uenosono ◽  
Jyunichi Nagata ◽  
Minemasa Oyama ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Vacuum ◽  
Argon Gas ◽  
Optimum Quantity ◽  
Planar Magnetron

Copper filling of deep sub-μm through-holes by high-vacuum planar magnetron sputtering using argon gas with added oxygen

2009 ◽  
Vol 256 (4) ◽  
pp. 1240-1243 ◽  
Author(s):  
Yoshio Uhara ◽  
Tsubasa Urano ◽  
Masatoshi Itoh ◽  
Hideo Hayashi ◽  
Yousuke Manba ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Vacuum ◽  
Argon Gas ◽  
Planar Magnetron

High-Vacuum Planar Magnetron Sputtering

1993 ◽  
Vol 32 (Part 1, No. 2) ◽  
pp. 902-906 ◽  
Author(s):  
Tatsuo Asamaki ◽  
Tsutomu Miura ◽  
Kohichi Hotate ◽  
Shingo Yonaiyama ◽  
Gen Nakamura ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Vacuum ◽  
Planar Magnetron

Development of high-vacuum planar magnetron sputtering using an advanced magnetic field geometry

2015 ◽  
Vol 33 (6) ◽  
pp. 063001 ◽  
Author(s):  
Takahiro Ohno ◽  
Daisuke Yagyu ◽  
Shigeru Saito ◽  
Yasunori Ohno ◽  
Hirofumi Nakano ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Magnetron Sputtering ◽  
High Vacuum ◽  
Planar Magnetron ◽  
Field Geometry

TiO2/SiO2 multilayer as an antireflective and protective coating deposited by microwave assisted magnetron sputtering

2013 ◽  
Vol 21 (2) ◽  
Author(s):  
M. Mazur ◽  
D. Wojcieszak ◽  
J. Domaradzki ◽  
D. Kaczmarek ◽  
S. Song ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Vacuum ◽  
Visible Spectrum ◽  
Ultra High Vacuum ◽  
Protective Film ◽  
Wetting Properties ◽  
Microwave Assisted ◽  
Atomic Force ◽  
Packed Structure ◽  
Protective Performance

AbstractIn this paper designing, preparation and characterization of multifunctional coatings based on TiO2/SiO2 has been described. TiO2 was used as a high index material, whereas SiO2 was used as a low index material. Multilayers were deposited on microscope slide substrates by microwave assisted reactive magnetron sputtering process. Multilayer design was optimized for residual reflection of about 3% in visible spectrum (450–800 nm). As a top layer, TiO2 with a fixed thickness of 10 nm as a protective film was deposited. Based on transmittance and reflectance spectra, refractive indexes of TiO2 and SiO2 single layers were calculated. Ultra high vacuum atomic force microscope was used to characterize the surface properties of TiO2/SiO2 multilayer. Surface morphology revealed densely packed structure with grains of about 30 nm in size. Prepared samples were also investigated by nanoindentation to evaluate their protective performance against external hazards. Therefore, the hardness of the thin films was measured and it was equal to 9.34 GPa. Additionally, contact angle of prepared coatings has been measured to assess the wetting properties of the multilayer surface.

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