Etching of bacterial endospores of Bacillus subtilis in an inductively coupled low-pressure plasma

2013 ◽  
Author(s):  
Benjamin Denis ◽  
Nikita Bibinov ◽  
Peter Awakowicz ◽  
Marina Raguse ◽  
Ralf Moeller
Keyword(s):  
Bacillus Subtilis ◽  
Low Pressure ◽  
Inductively Coupled ◽  
Pressure Plasma ◽  
Bacterial Endospores ◽  
Low Pressure Plasma

scholarly journals Sterilization of beehive material with a double inductively coupled low pressure plasma

2016 ◽  
Vol 49 (37) ◽  
pp. 374002 ◽  
Author(s):  
M Priehn ◽  
B Denis ◽  
P Aumeier ◽  
W H Kirchner ◽  
P Awakowicz ◽  
...  
Keyword(s):  
Low Pressure ◽  
Inductively Coupled ◽  
Pressure Plasma ◽  
Low Pressure Plasma

Use of a low-pressure plasma discharge for the decontamination and sterilization of medical devices

2008 ◽  
Vol 80 (9) ◽  
pp. 1939-1951 ◽  
Author(s):  
François Rossi ◽  
Ondrej Kylián ◽  
Hubert Rauscher ◽  
Douglas Gilliland ◽  
Lucel Sirghi
Keyword(s):  
Medical Devices ◽  
Inductively Coupled Plasma ◽  
Low Pressure ◽  
Plasma Discharge ◽  
Bacterial Spores ◽  
Plasma Discharges ◽  
Inductively Coupled ◽  
Biological Contamination ◽  
Pressure Plasma ◽  
Low Pressure Plasma

Nonequilibrium low-pressure plasma discharges are extensively studied for their applications in the field of decontamination and sterilization of medical devices. The aim of this contribution is to discuss and demonstrate feasibility of oxygen low-pressure inductively coupled plasma (ICP) discharges for removal of various kinds of biological contamination. We demonstrate the ability of ICP discharges for the sterilization of bacterial spores and the removal of biological contamination from proteins and pyrogens.

Characteristics of Low Pressure Plasma Sprayed Alumina Coating

2009 ◽  
Vol 24 (1) ◽  
pp. 117-121 ◽  
Author(s):  
Chun-Ming DENG ◽  
Ke-Song ZHOU ◽  
Min LIU ◽  
Chang-Guang DENG ◽  
Jin-Bing SONG ◽  
...  
Keyword(s):  
Low Pressure ◽  
Alumina Coating ◽  
Pressure Plasma ◽  
Low Pressure Plasma ◽  
Plasma Sprayed

scholarly journals Effect of Low-Pressure Plasma Treatment Parameters on Wrinkle Features

Materials ◽  
2020 ◽  
Vol 13 (17) ◽  
pp. 3852
Author(s):  
Bongjun Gu ◽  
Dongwook Ko ◽  
Sungjin Jo ◽  
Dong Choon Hyun ◽  
Hyeon-Ju Oh ◽  
...  
Keyword(s):  
Power Flow ◽  
Treatment Time ◽  
Argon Plasma ◽  
Negative Ions ◽  
Low Pressure ◽  
Nitrogen Plasma ◽  
Pressure Plasma ◽  
Positive Ions ◽  
Low Pressure Plasma ◽  
Optical Adhesive

Wrinkles attract significant attention due to their ability to enhance the mechanical and optical characteristics of various optoelectronic devices. We report the effect of the plasma gas type, power, flow rate, and treatment time on the wrinkle features. When an optical adhesive was treated using a low-pressure plasma of oxygen, argon, and nitrogen, the oxygen and argon plasma generated wrinkles with the lowest and highest wavelengths, respectively. The increase in the power of the nitrogen and oxygen plasma increased the wavelengths and heights of the wrinkles; however, the increase in the power of the argon plasma increased the wavelengths and decreased the heights of the wrinkles. Argon molecules are heavier and smaller than nitrogen and oxygen molecules that have similar weights and sizes; moreover, the argon plasma comprises positive ions while the oxygen and nitrogen plasma comprise negative ions. This resulted in differences in the wrinkle features. It was concluded that a combination of different plasma gases could achieve exclusive control over either the wavelength or the height and allow a thorough analysis of the correlation between the wrinkle features and the characteristics of the electronic devices.

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