Effects of arsenic source molecule on N-H related defects formation in GaAsN grown by chemical beam epitaxy

Author(s):  
Yoshio Ohshita ◽  
Koshiro Demizu ◽  
Omar Elleuch ◽  
Kazuma Ikede ◽  
Nobuaki Kojima ◽  
...  
2013 ◽  
Vol 10 (11) ◽  
pp. 1477-1480 ◽  
Author(s):  
Boussairi Bouzazi ◽  
Nobuaki Kojima ◽  
Yoshio Ohshita ◽  
Masafumi Yamaguchi

Author(s):  
Byung-Teak Lee

Grown-in dislocations in GaAs have been a major obstacle in utilizing this material for the potential electronic devices. Although it has been proposed in many reports that supersaturation of point defects can generate dislocation loops in growing crystals and can be a main formation mechanism of grown-in dislocations, there are very few reports on either the observation or the structural analysis of the stoichiometry-generated loops. In this work, dislocation loops in an arsenic-rich GaAs crystal have been studied by transmission electron microscopy.The single crystal with high arsenic concentration was grown using the Horizontal Bridgman method. The arsenic source temperature during the crystal growth was about 630°C whereas 617±1°C is normally believed to be optimum one to grow a stoichiometric compound. Samples with various orientations were prepared either by chemical thinning or ion milling and examined in both a JEOL JEM 200CX and a Siemens Elmiskop 102.


1998 ◽  
Vol 188 (1-4) ◽  
pp. 377-382 ◽  
Author(s):  
Jeong-Rae Ro ◽  
Sung-Bock Kim ◽  
El-Hang Lee

1992 ◽  
Vol 28 (11) ◽  
pp. 1001-1002 ◽  
Author(s):  
F.S. Choa ◽  
W.T. Tsang ◽  
R.A. Logan ◽  
R.P. Gnall ◽  
U. Koren ◽  
...  

2001 ◽  
Vol 178 (1-4) ◽  
pp. 63-74
Author(s):  
N. Dietz ◽  
S.C. Beeler ◽  
J.W. Schmidt ◽  
H.T. Tran

2011 ◽  
Vol 158 (2) ◽  
pp. D72 ◽  
Author(s):  
Ali Dabirian ◽  
Scott Harada ◽  
Yury Kuzminykh ◽  
Silviu Cosmin Sandu ◽  
Estelle Wagner ◽  
...  

2000 ◽  
Vol 618 ◽  
Author(s):  
J. Bettini ◽  
M.M.G. de Carvalho ◽  
M. A. Hayashi ◽  
L. P. Cardoso ◽  
D. Ugarte

ABSTRACTIn this work, In0.5Ga0.5P layers were grown by Chemical Beam Epitaxy on GaAs (001) substrates. A set of samples was grown with temperatures kept in the range of 500°C to 560°C with V/III ratio 15. Another set was grown at 560°C with V/II ratio varied in the range 15 to 35. The evolution of ordering as function of growth temperature and V/III ratio was evaluated by photoluminescence measurements at 77K, Transmission Electron Diffraction (TED) and images using Transmission Electron Microscopy (TEM)-Dark Field. A 48meV reduction in the band gap energy was measured by photoluminescence measurements at 77 K when growth temperature was increased. This result is associated to the occurrence of CuPtB ordering in the InGaP layers observed by TED. The TEM-Dark field examination shows that the ordered domains are larger for samples grown at higher temperaturesA small reduction in band gap, from 1.915eV to 1.902eV, occurs when the V/III ratio is increased from 15 to 35. The TED patterns present diffuse scattering for all samples. For those grown with higher V/III ratio, spots are also observed. TEM-dark field images show that the ordered regions become larger, elongated and inclined; some of them exhibit long range ordering


1998 ◽  
Vol 510 ◽  
Author(s):  
R. Jothilingam ◽  
T. Farrell ◽  
T.B. Joyce ◽  
P.J. Goodhew

AbstractWe report the photo modified growth of GaAs by chemical beam epitaxy at substrate temperatures in the range 335 to 670°C using triethygallium (TEG) and arsine. A mercury-xenon lamp (electrical power 200 W) provided the irradiation for the photoassisted growth. The growth was monitored in real time by laser reflectometry (LR) using a 670 nm semiconductor laser, and the optically determined growth rate agreed with that obtained from the layer thickness measured by cross sectional transmission electron microscopy. The observed photo-enhancement of the growth rate at low substrate temperatures and inhibition at high substrate temperatures is thermal in origin, consistent with raising the substrate temperature by 10±3°C. Cross sectional transmission electron microscopy showed that the photoassisted layers are essentially free from dislocations


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