Modeling of ionizing radiation-induced degradation in multiple gate field effect transistors

Author(s):  
Ivan S. Esqueda ◽  
Hugh J. Barnaby ◽  
Keith E. Holbert ◽  
Farah E. Mamouni ◽  
Ronald D. Schrimpf
2011 ◽  
Vol 58 (2) ◽  
pp. 499-505 ◽  
Author(s):  
Ivan Sanchez Esqueda ◽  
Hugh J. Barnaby ◽  
Keith E. Holbert ◽  
Farah El-Mamouni ◽  
Ronald D. Schrimpf

2011 ◽  
Vol 10 (04n05) ◽  
pp. 891-898 ◽  
Author(s):  
RAVISHANKAR S. DUDHE ◽  
HARSHIL N. RAVAL ◽  
ANIL KUMAR ◽  
V. RAMGOPAL RAO

Organic semiconducting material based sensors have been used for various environmental applications. Organic field effect transistors (OFETs) also find their applications in explosive vapor detection and total ionizing radiation dose determination. OFETs using poly 3-hexylthiophene (P3HT), a p-type organic semiconductor material and CuII tetraphenylporphyrin ( CuTPP ) composite as their active material were investigated as sensors for detection of various nitro-based explosive vapors with greater than parts per billion sensitivity range. Significant changes, suitable for sensor response, were observed in ON current (Ion) and transconductance (gm) extracted from electrical characteristics of the OFET after exposure to vapors of various explosive compounds. However, a similar device response was not observed to strong oxidizing agents such as benzoquinone (BQ) and benzophenone (BP). Also, the use of organic semiconducting material sensors for determining total ionizing radiation dose was studied, wherein the conductivity of the material was measured as a function of total ionizing radiation dose. An organic semiconducting material resistor was exposed to γ-radiation and it was observed that the change in resistance was proportional to the ionizing radiation dose. Changes in various parameters extracted from electrical characteristics of the OFET after γ-radiation exposure resulted in an improved sensitivity. To protect the organic semiconductor layer from the degradation in the ambient the sensors were passivated with a thin layer of silicon nitride.


Electronics ◽  
2013 ◽  
Vol 2 (4) ◽  
pp. 234-245 ◽  
Author(s):  
Ivan Esqueda ◽  
Cory Cress ◽  
Travis Anderson ◽  
Jonathan Ahlbin ◽  
Michael Bajura ◽  
...  

1985 ◽  
Vol 57 (2) ◽  
pp. 581-590 ◽  
Author(s):  
F. A. Buot ◽  
W. T. Anderson ◽  
A. Christou ◽  
A. B. Campbell ◽  
A. R. Knudson

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