Some diagnostic interpretations from railgun plasma profile experiments

1984 ◽  
Vol 20 (2) ◽  
pp. 332-335 ◽  
Author(s):  
D. Stainsby ◽  
A. Bedford
Keyword(s):  
2021 ◽  
Author(s):  
Mitchell D Clement ◽  
Nikolas Logan ◽  
Mark D Boyer

Abstract GPECnet is a densely connected neural network that has been trained on GPEC data, to predict the plasma stability, neoclassical toroidal viscosity (NTV) torque, and optimized 3D coil current distributions for desired NTV torque profiles. Using NTV torque, driven by non-axisymmetric field perturbations in a tokamak, can be vital in optimizing pedestal performance by controlling the rotation profile in both the core, to ensure tearing stability, and the edge, to avoid edge localized modes (ELMs). The Generalized Perturbed Equilibrium Code (GPEC) software package can be used to calculate the plasma stability to 3D perturbations and the NTV torque profile generated by applied 3D magnetic fields. These calculations, however, involve complex integrations over space and energy distributions, which takes time to compute. Initially, GPECnet has been trained solely on data representative of the quiescent H-mode (QH) scenario, in which neutral beams are often balanced and toroidal rotation is low across the plasma profile. This work provides the foundation for active control of the rotation shear using a combination of beams and 3D fields for robust and high performance QH mode operation.


2015 ◽  
Vol 2015 (1) ◽  
pp. 000757-000760
Author(s):  
Y. Takaya ◽  
Y. Tanioka ◽  
H. Yoshino ◽  
A. Osawa

In recent years, both low plasma damage and low temperature deposition technic for polymer substrates (e.g. PCB, films and etc.) are often required. We have developed a plasma enhanced dual rotatable magnetron sputter source assisted with inductively coupled plasma (ICP) using low inductance antenna (LIA). LIA has same unique characteristics, a)low voltage high density plasma, b)well controllability of plasma profile to ensure uniformity over large area, c)ionization of sputtered particle and etc. when in being used as a plasma assistant, and besides, LIA can be used as a ICP source for polymer surface modification. We introduce a variety of the possibilities of whether this sputter source is usable for the process of the fabrication of PCB.


2018 ◽  
Vol 155 ◽  
pp. 185-193 ◽  
Author(s):  
Agnieszka Gęgotek ◽  
Pedro Domingues ◽  
Adam Wroński ◽  
Piotr Wójcik ◽  
Elżbieta Skrzydlewska
Keyword(s):  

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