Development of a Slot-Excited Planar Microwave Discharge Device for Uniform Plasma Processing

2004 ◽  
Vol 32 (1) ◽  
pp. 101-107 ◽  
Author(s):  
Y. Yasaka ◽  
N. Ishii ◽  
T. Yamamoto ◽  
M. Ando ◽  
M. Takahashi
2019 ◽  
Vol 90 (10) ◽  
pp. 103502
Author(s):  
Zhongkai Zhang ◽  
Yu Liu ◽  
Jinxiang Cao ◽  
Pengcheng Yu ◽  
Xiao Zhang ◽  
...  

1996 ◽  
Vol 5 (2) ◽  
pp. 299-304 ◽  
Author(s):  
Shin Hiyama ◽  
Takashi Ono ◽  
Satoru Iizuka ◽  
Noriyoshi Sato

1999 ◽  
Vol 38 (Part 1, No. 7B) ◽  
pp. 4309-4312 ◽  
Author(s):  
Yasuyoshi Yasaka ◽  
Daiki Nozaki ◽  
Kazuya Koga ◽  
Makoto Ando ◽  
Tetsuya Yamamoto ◽  
...  

2015 ◽  
Vol 117 (15) ◽  
pp. 153302 ◽  
Author(s):  
Hyun Jun Kim ◽  
Hye-Ju Hwang ◽  
Dong Hwan Kim ◽  
Jeong Hee Cho ◽  
Hee Sun Chae ◽  
...  

Author(s):  
M. G. Burke ◽  
M. N. Gungor ◽  
M. A. Burke

Intermetallic matrix composites are candidates for ultrahigh temperature service when light weight and high temperature strength and stiffness are required. Recent efforts to produce intermetallic matrix composites have focused on the titanium aluminide (TiAl) system with various ceramic reinforcements. In order to optimize the composition and processing of these composites it is necessary to evaluate the range of structures that can be produced in these materials and to identify the characteristics of the optimum structures. Normally, TiAl materials are difficult to process and, thus, examination of a suitable range of structures would not be feasible. However, plasma processing offers a novel method for producing composites from difficult to process component materials. By melting one or more of the component materials in a plasma and controlling deposition onto a cooled substrate, a range of structures can be produced and the method is highly suited to examining experimental composite systems. Moreover, because plasma processing involves rapid melting and very rapid cooling can be induced in the deposited composite, it is expected that processing method can avoid some of the problems, such as interfacial degradation, that are associated with the relatively long time, high temperature exposures that are induced by conventional processing methods.


2008 ◽  
Author(s):  
Venkateswara Bommisetty ◽  
Rojan L. Karmacharya ◽  
Suravi Shrestha ◽  
David Galipeau

2014 ◽  
Vol 62 (4) ◽  
pp. 123-128 ◽  
Author(s):  
Naoji YAMAMOTO ◽  
Yoshiaki HIRAOKA ◽  
Hideki NAKASHIMA
Keyword(s):  

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