Patterning of N:Ge2Sb2Te5 Films and the Characterization of Etch Induced Modification for Non-Volatile Phase Change Memory Applications
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2008 ◽
Vol 155
(2)
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pp. D137
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2014 ◽
Vol 127
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pp. 77-80
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2008 ◽
Vol 37
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pp. 535-539
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2014 ◽
Vol 16
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pp. 10810
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