Influence of Isothermal Chemical Vapor Deposition and Chemical Vapor Infiltration Conditions on the Deposition Kinetics and Structure of Boron Nitride

2004 ◽  
Vol 82 (5) ◽  
pp. 1187-1195 ◽  
Author(s):  
Marc Leparoux ◽  
Lionel Vandenbulcke ◽  
Christian Clinard
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Infiltration ◽  
Deposition Kinetics ◽  
Vapor Infiltration

Silicon Carbide Composites Deposited in Silicon Carbide Whiskers by CVI Process

2012 ◽  
Vol 512-515 ◽  
pp. 789-792
Author(s):  
Fan Tao Meng ◽  
Shan Yi Du ◽  
Yu Min Zhang
Keyword(s):  
Silicon Carbide ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Infiltration ◽  
Dilute Gas ◽  
Silicon Carbide Whiskers ◽  
Sic Whiskers ◽  
Sic Composites ◽  
Vapor Infiltration

Chemical vapor deposition (CVD) is an effective method of preparing silicon carbide whiskers or films and chemical vapor infiltration (CVI) can be successfully used as the preparation of SiC composites. In this paper, silicon carbides whiskers were firstly deposited on substrates of RB-SiC by CVD process and then silicon carbide composites were prepared by chemical vapor infiltration in the SiC whiskers in an upright chemical vapor deposition furnace of Φ150mm×450mm with methyltrichloride silicane (MTS) as precursor gas, H2 as carrier gas and Ar as dilute gas. The morphologies of the SiC whiskers grown on RB-SiC substrate and SiC composites infiltrated in SiC whiskers were determined by scanning electron microscope (SEM), and the crystalline phase of the final deposits were confirmed with X-ray diffractometry (XRD) As a result, the curly defects of whiskers decrease with the addition of dilute gas. And by chemical vapor infiltration in SiC whiskers the, SiC composites were successfully prepared. Finally the deposits were determined as β-SiC.

Low Temperature Chemical Vapor Deposition of Hafnium Nitride−Boron Nitride Nanocomposite Films

2009 ◽  
Vol 21 (23) ◽  
pp. 5601-5606 ◽  
Author(s):  
Navneet Kumar ◽  
Wontae Noh ◽  
Scott R. Daly ◽  
Gregory S. Girolami ◽  
John R. Abelson
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Boron Nitride ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Nanocomposite Films ◽  
Hafnium Nitride
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