A Simulation-based Correlation of Cross-Sectional Area of the Thin Film Produced by Laser Chemical Vapor Deposition With a Moving Laser Beam

2004 ◽  
Vol 126 (4) ◽  
pp. 796-800 ◽  
Author(s):  
Yuwen Zhang
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Laser Beam ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Cross Sectional Area ◽  
Sectional Area ◽  
Laser Chemical Vapor Deposition ◽  
Cross Sectional ◽  
Simulation Based

A parametric study on shape and cross-sectional area of the thin film produced by Laser Chemical Vapor Deposition (LCVD) with a moving laser beam is presented. The problem is formulated in the coordinate system that moves with the laser beam, and, therefore, the problem is a quasi-steady state. The effects of laser scanning velocity, laser power, and radius of the laser beam on the shapes of the deposited film are investigated. A simulation-based correlation of the cross-sectional area is proposed based on the simulation results.

Quasi-Steady State Natural Convection in Laser Chemical Vapor Deposition With a Moving Laser Beam

2002 ◽  
Author(s):  
Yuwen Zhang
Keyword(s):  
Chemical Vapor Deposition ◽  
Natural Convection ◽  
Laser Beam ◽  
Vapor Deposition ◽  
Laser Power ◽  
Thermal Model ◽  
Chemical Vapor ◽  
Quasi Steady State ◽  
Laser Chemical Vapor Deposition ◽  
Deposited Film

Numerical analysis of laser chemical vapor deposition (LCVD) of Titanium Nitride by a moving laser beam is investigated numerically. The effect of natural convection due to temperature and concentration differences in the gases mixture is modeled and implemented into the thermal model of LCVD by a moving laser beam. The problem is formulated in the coordinate system that moves with the laser beam. The results show that the effect of natural convection on the shape of deposited film is very insignificant for cases with lower laser power but it becomes important when the laser power is increased.

Micro-RBS Analysis of Masklessly Fabricated Structures

1988 ◽  
Vol 128 ◽  
Author(s):  
A. Kinomura ◽  
M. Takai ◽  
T. Matsuo ◽  
M. Satou ◽  
M. Kiuchi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Ion Implantation ◽  
Laser Beam ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Local Distribution ◽  
Helium Ions ◽  
Laser Chemical Vapor Deposition

ABSTRACTRutherford backscattering (RBS) analysis of small-sized structures, fabricated by laser chemical vapor deposition (LCVD) with a focused laser beam and ion implantation with a focused ion beam (FIB), has been performed by a microprobe with focused 1.5 MeV helium ions. Micro-RBS spectra and RBS-mapping images revealed a local distribution of masklessly deposited Mo layers on GaAs and local doses of masklessly implanted Au atoms in Si.

Quasi-Steady State Natural Convection in Laser Chemical Vapor Deposition With a Moving Laser Beam

2003 ◽  
Vol 125 (3) ◽  
pp. 429-437 ◽  
Author(s):  
Yuwen Zhang
Keyword(s):  
Chemical Vapor Deposition ◽  
Steady State ◽  
Natural Convection ◽  
Laser Beam ◽  
Vapor Deposition ◽  
Laser Power ◽  
Gaseous Mixture ◽  
Chemical Vapor ◽  
Quasi Steady State ◽  
Laser Chemical Vapor Deposition

Numerical analysis of laser chemical vapor deposition (LCVD) of titanium nitride by a moving laser beam is presented. The effect of natural convection due to temperature and concentration differences in the gaseous mixture is modeled and implemented into thermal model of LCVD by a moving laser beam. The problem is formulated in a coordinate system that moves with the laser beam and therefore, the problem is a quasi-steady state problem. The results show that the effect of natural convection on the shape of deposited film is very insignificant for cases with a laser power of 300 W but becomes important when the laser power is increased to 360 W.

Preparation of Y Doped BaZrO3 Thin Film Electrolyte By Using Laser Chemical Vapor Deposition

2020 ◽  
Vol MA2020-02 (40) ◽  
pp. 2607-2607
Author(s):  
Takaaki Sakai ◽  
Tohru Kato ◽  
Hirokazu Katsui ◽  
Yohei Tanaka ◽  
Takashi Goto
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Thin Film Electrolyte ◽  
Film Electrolyte
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