A real time Monte Carlo simulation of thin film nucleation in localized‐laser chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.342442 ◽

1988 ◽

Vol 64 (10) ◽

pp. 4920-4942 ◽

Author(s):

David E. Kotecki ◽

Irving P. Herman

Keyword(s):

Thin Film ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapor Deposition ◽

Real Time ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Film Nucleation

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A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition

Computational Materials Science ◽

10.1016/s0927-0256(97)00173-0 ◽

1998 ◽

Vol 10 (1-4) ◽

pp. 116-126 ◽

Author(s):

J. Flicstein ◽

S. Pata ◽

J.M. Le Solliec ◽

L.S. How Kee Chun ◽

J.F. Palmier ◽

...

Keyword(s):

Thin Film ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Chemical Vapor ◽

Film Microstructure

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SiC thin film preparation by ArF excimer laser chemical vapor deposition Part 1: Rate of photolysis of alkylsilanes by ArF excimer laser and their decomposition products

Thin Solid Films ◽

10.1016/0040-6090(95)08186-0 ◽

1996 ◽

Vol 274 (1-2) ◽

pp. 70-75 ◽

Author(s):

Akio Watanabe ◽

Kazuo Osato ◽

Shinji Ninomiya ◽

Masakazu Mukaida ◽

Tatsuo Tsunoda ◽

...

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Excimer Laser ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Decomposition Products ◽

Thin Film Preparation ◽

Film Preparation ◽

Arf Excimer Laser

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Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l150 ◽

1997 ◽

Vol 36 (Part 2, No. 2A) ◽

pp. L150-L153 ◽

Author(s):

Atsushi Maruyama ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Toshiro Maruyama

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Lattice kinetic Monte Carlo simulation of epitaxial growth of silicon thin films in H 2 /SiH 4 chemical vapor deposition systems

Thin Solid Films ◽

10.1016/j.tsf.2017.05.013 ◽

2017 ◽

Vol 634 ◽

pp. 121-133 ◽

Author(s):

Juan Pablo Balbuena ◽

Ignacio Martin-Bragado

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapor Deposition ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Kinetic Monte Carlo ◽

Chemical Vapor ◽

Kinetic Monte Carlo Simulation ◽

Silicon Thin Films

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Preparation of Y-doped BaZrO3 thin film electrolyte by laser chemical vapor deposition

Materials Today Communications ◽

10.1016/j.mtcomm.2020.101184 ◽

2020 ◽

Vol 24 ◽

pp. 101184

Author(s):

Takaaki Sakai ◽

Tohru Kato ◽

Hirokazu Katsui ◽

Yohei Tanaka ◽

Takashi Goto

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Thin Film Electrolyte ◽

Film Electrolyte

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Real time measurement of deposition initiation and rate in laser chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.335680 ◽

1985 ◽

Vol 58 (1) ◽

pp. 327-331 ◽

Author(s):

S. D. Allen ◽

R. Y. Jan ◽

S. M. Mazuk ◽

S. D. Vernon

Keyword(s):

Chemical Vapor Deposition ◽

Real Time ◽

Vapor Deposition ◽

Chemical Vapor ◽

Time Measurement ◽

Laser Chemical Vapor Deposition ◽

Real Time Measurement

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Shape of Film Grown on Microsize Trenches and Holes by Chemical Vapor Deposition: 3-Dimensional Monte Carlo Simulation

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.6171 ◽

1995 ◽

Vol 34 (Part 1, No. 11) ◽

pp. 6171-6177 ◽

Author(s):

Yasunobu Akiyama ◽

Satoshi Matsumura ◽

Nobuyuki Imaishi

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

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Investigation of optical emission spectroscopy in diamond chemical vapor deposition by Monte Carlo simulation

Chinese Optics Letters ◽

10.3788/col20080603.0218 ◽

2008 ◽

Vol 6 (3) ◽

pp. 218-221

Author(s):

王志军 Zhijun Wang ◽

董丽芳 Lifang Dong ◽

李盼来 Panlai Li ◽

尚勇 Yong Shang ◽

何寿杰 Shoujie He

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Chemical Vapor ◽

Optical Emission ◽

Diamond Chemical Vapor Deposition

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Real-time volumetric growth rate measurements and feedback control of three-dimensional laser chemical vapor deposition

Applied Physics A ◽

10.1007/s003390050778 ◽

1998 ◽

Vol 67 (3) ◽

pp. 323-329 ◽

Author(s):

J.L. Maxwell ◽

J. Pegna ◽

D.V. Messia

Keyword(s):

Growth Rate ◽

Chemical Vapor Deposition ◽

Feedback Control ◽

Real Time ◽

Vapor Deposition ◽

Three Dimensional ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Volumetric Growth

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Monte Carlo Simulation of Electron Velocity Distribution and Gas Phase Process in Electron-Assisted Chemical Vapor Deposition

Plasma Science and Technology ◽

10.1088/1009-0630/7/3/014 ◽

2005 ◽

Vol 7 (3) ◽

pp. 2845-2848

Author(s):

Dong Lifang ◽

Ma Boqin ◽

Shang Yong ◽

Wang Zhijun

Keyword(s):

Monte Carlo Simulation ◽

Monte Carlo ◽

Chemical Vapor Deposition ◽

Velocity Distribution ◽

Gas Phase ◽

Vapor Deposition ◽

Chemical Vapor ◽

Electron Velocity ◽

Electron Velocity Distribution ◽

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