Quantitative Measurement of Thin Film Adhesion Force

Author(s):  
Li-Chih Tsai ◽  
Maysam Rezaee ◽  
Muhammad Istiaque Haider ◽  
Armin Yazdi ◽  
Nathan P. Salowitz

Abstract Thin film and micro-fabricated devices are increasingly being used in actuators, sensors, and processors deployed in smart materials. The physical survival of these devices is paramount to their usefulness but existing methods for testing and analysis are limited and challenging due to their properties. The most common test involve the manual application and removal of (unspecified) tape but does not provide a result in scientific units and has large variation (> 35%). This paper presents a study into the effects of parameters of tape application and peeling on the adhesion strength of the tape. This information was then used to create a test methodology using commonly available laboratory equipment, which would control these parameters to minimize variation and produce repeatable quantitative results. Experiments using this test methodology were performed with tape directly adhered to several different substrates as well as tape adhered to a thin film which was then peeled off of a backing. Ongoing work is seeking to identify and address different forms of failure including adhesive failure, cohesive failure, or survival.

1991 ◽  
Vol 239 ◽  
Author(s):  
H. S. Jeong ◽  
Y. Z. Chu ◽  
M. B. Freiler ◽  
C. Durning ◽  
R. C. White

ABSTRACTFracture energy (Ga) of BPDA-PDA polyimide (PI) on modified and unmodified Si surfaces was measured by the “blister” test as a function of final cure temperature. It is proven quantitatively that surface modification prior to thin film deposition enhances adhesion. Metal adhesion to PI was also measured by the same method. Reproducibility of the data was found to be exceptionally good for both cases. The linear elastic model is quite valid for the test of thin film adhesion. Therefore, it is believed that this test is best suited for Ga measurements in the study of thin film adhesion for microelectronic packaging.


Nano Letters ◽  
2021 ◽  
Author(s):  
Jingcheng Ma ◽  
Jin Myung Kim ◽  
Muhammad Jahidul Hoque ◽  
Kamila J. Thompson ◽  
SungWoo Nam ◽  
...  

2016 ◽  
Vol 13 (3) ◽  
pp. 95-101 ◽  
Author(s):  
Carol Putman ◽  
Rachel Cramm Horn ◽  
J. Ambrose Wolf ◽  
Daniel Krueger

Low temperature cofired ceramic (LTCC) has been established as an excellent packaging technology for high-reliability, high-density microelectronics. The functionality and robustness of rework have been increased through the incorporation of a physical vapor deposition (PVD) thin film Ti/Cu/Pt/Au metallization. PVD metallization is suitable for radio frequency (RF) applications as well as digital systems. Adhesion of the Ti “adhesion layer” to the LTCC as-fired surface is not well understood. Although previous work has established extrinsic parameters for delamination mechanisms of thin films on LTCC substrates, there is incomplete information regarding the intrinsic (i.e., thermodynamic) parameters in the literature. This article analyzes the thermodynamic favorability of adhesion between Ti, Cr, and their oxide coatings on LTCC (assumed as amorphous silica glass and Al2O3). Computational molecular calculations are used to determine interface energy as an indication of molecular stability between pair of materials at specific temperature. The end result will expand the understanding of thin film adhesion to LTCC surfaces and assist in increasing the long-term reliability of the interface bonding on RF microelectronic layers.


2010 ◽  
Vol 44 (3) ◽  
pp. 034003
Author(s):  
Jae Hyun Kim ◽  
Martin Y M Chiang ◽  
Daisuke Kawaguchi ◽  
Naomi Eidelman ◽  
Christopher M Stafford ◽  
...  

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