Study on the characteristics of TiAlN thin film deposited by atomic layer deposition method

2001 ◽  
Vol 19 (6) ◽  
pp. 2831 ◽  
Author(s):  
Jaehyoung Koo ◽  
June-Woo Lee ◽  
Taehan Doh ◽  
Yangdo Kim ◽  
Young-Do Kim ◽  
...  
2014 ◽  
Vol 35 (3) ◽  
pp. 360-362 ◽  
Author(s):  
Chi-Sun Hwang ◽  
Sang-Hee Ko Park ◽  
Himchan Oh ◽  
Min-Ki Ryu ◽  
Kyoung-Ik Cho ◽  
...  

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