High-Speed Proximity Effect Correction System for Electron-Beam Projection Lithography by Cluster Processing

2003 ◽  
Vol 42 (Part 1, No. 6B) ◽  
pp. 3827-3832 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
High Speed ◽  
Projection Lithography ◽  
Beam Projection ◽  
Proximity Effect Correction ◽  
Correction System

Fast and Simplified Technique of Proximity Effect Correction for Ultra Large Scale Integrated Circuit Patterns in Electron-Beam Projection Lithography

2002 ◽  
Vol 41 (Part 1, No. 6B) ◽  
pp. 4167-4172 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Kimitoshi Takahashi ◽  
...  
Keyword(s):  
Electron Beam ◽  
Integrated Circuit ◽  
Proximity Effect ◽  
Large Scale ◽  
Projection Lithography ◽  
Beam Projection ◽  
Proximity Effect Correction

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction

Development of data conversion system for electron beam projection lithography

2002 ◽  
Vol 20 (6) ◽  
pp. 2672 ◽  
Author(s):  
Kokoro Kato ◽  
Kuninori Nishizawa ◽  
Tamae Haruki ◽  
Tadao Inoue ◽  
Koichi Kamijo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Data Conversion ◽  
Projection Lithography ◽  
Conversion System ◽  
Beam Projection
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