Comparison of ZnO nanostructures grown using pulsed laser deposition, metal organic chemical vapor deposition, and physical vapor transport

2009 ◽  
Vol 27 (3) ◽  
pp. 1678 ◽  
Author(s):  
V. E. Sandana ◽  
D. J. Rogers ◽  
F. Hosseini Teherani ◽  
R. McClintock ◽  
C. Bayram ◽  
...  
Keyword(s):  
Vapor Deposition ◽  
Pulsed Laser ◽  
Chemical Vapor ◽  
Vapor Transport ◽  
Laser Deposition ◽  
Physical Vapor Transport ◽  
Organic Chemical ◽  
Zno Nanostructures ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Controlled Morphologies of Nanostructured ZnO Films by MOCVD Method

2014 ◽  
Vol 492 ◽  
pp. 311-315
Author(s):  
Bashir Ahmmad ◽  
Kensaku Kanomata ◽  
Fumihiko Hirose
Keyword(s):  
Vapor Deposition ◽  
Deposition Time ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Zno Films ◽  
Zno Nanostructures ◽  
Xps Analysis ◽  
Metal Organic ◽  
Drastic Effect ◽  
Organic Chemical Vapor Deposition

Metal-organic chemical vapor deposition (MOCVD) method has been applied to grow nanostructured ZnO films on Si (100) substrate at temperatures ranging from 200 to 550 °C. The as-prepared films were characterized by XRD, SEM, XPS analysis. The growth rate of ZnO films increases with increasing the deposition temperatures. The deposition temperatures have a drastic effect on the crystallinity and morphology of the nanostructured ZnO. Whisker shaped ZnO is formed at a temperature of 350 °C. The deposition time also affects the morphology of the particles. At 400 °C, sample with one hour deposition forms whisker shaped ZnO nanostructures whereas that of with two hours deposition forms flower-like nanostructures.

Sign in / Sign up

Export Citation Format

Share Document